Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Horst Wengenroth"'
Publikováno v:
Microelectronic Engineering. 21:267-270
Current state of process capabilities and performance items of a recently developed chemically amplified positive tone deep UV (DUV) resist is presented. The material is based on three components: an α, α-bis (arylsulfonyl) diazomethane as phtoacid
Publikováno v:
Journal of Photopolymer Science and Technology. 5:55-66
The chemistry and some performance aspects of a novel chemically amplified positive tone photoresist system sensitive to KrF excimer laser radiation is described. The material consists of three components: an α, α-bisarylsulfonyl diazomethane as th
Autor:
Francoise Vinet, Takanori Kudo, Horst Wengenroth, Natusmi Suehiro, Charles Le Cornec, Yoshiaki Kinoshita, Thomas J. Lynch, Seiya Masuda, Thierry Mourier, Yuko Nozaki, Horst Roeschert, John Kochan, Munirathna Padmanaban, Klaus Juergen Przybilla, Hiroshi Okazaki, Gary C. Escher, Georg Pawlowski, Setha G. Olson, Walter Spiess
Publikováno v:
Advances in Resist Technology and Processing XI.
This contribution emphasizes resist application site by communicating lithographic results for AZ DX 46, obtained using the GCA XLS 7800/31 stepper, NA equals 0.53, equipped with krypton fluoride excimer laser ((lambda) equals 248 nm), model 4500 D,
Autor:
Yuko Nozaki, Thomas J. Lynch, Munirathna Padmanaban, Yoshiaki Kinoshita, Horst Wengenroth, Horst Roeschert, Natusmi Suehiro, Takanori Kudo, Walter Spiess, Klaus Juergen Przybilla, Seiya Masuda, Hiroshi Okazaki, Georg Pawlowski
Publikováno v:
Advances in Resist Technology and Processing XI.
AZ DX series are chemically amplified, three component resists based on a poly(4-hydroxystyrene-co-3-methyl-4-hydroxystyrene) matrix resin, a poly(N,O-acetal) dissolution inhibitor, and a bis(arylsulfonyl)diazomethane acid generator. The previously d
Autor:
Walter Spiess, Horst Roeschert, Charlotte Eckes, Hiroshi Okazaki, Takanori Kudo, Horst Wengenroth, Georg Pawlowski, Munirathna Padmanaban, Hajime Endo, Natusmi Suehiro, Klaus Juergen Przybilla, Yoshiaki Kinoshita, Seiya Masuda
Publikováno v:
Advances in Resist Technology and Processing X.
This paper presents some methods for the investigation of delay time I3 induced effects typical of an advanced acetal-based photoresist, and strategies to improve the latent image stability. Dissolution rate monitoring was used to investigate the inc
Publikováno v:
SPIE Proceedings.
The present paper gives a first introduction into the resist scheme and the chemistry of a newly developed acetal-based, positive tone deep UV photoresist, called RS 1594/E. The material consists of a phenolic polymer, a dissolution inhibitor, and a
Publikováno v:
Chemische Berichte. 121:1643-1646
Bei der Thermolyse der Diazoverbindung 1 in Ethanol bzw. Piperidin oder Morpholin entstehen die Enole 3a–c von β-Ketocarbonsaurederivaten. Z- und E-Konfigurationen stehen miteinander im Gleichgewicht. Die Bestimmung der Geschwindigkeits-konstanten
Publikováno v:
Tetrahedron Letters. 30:5253-5256
Increasing steric hindrance in β-keto carboxylic acids leads to an increasing kinetic stability towards decarboxylation, till systems are reached which are completely stable at room temperature. Simultaneously the tautomeric equilibrium is changed i
Publikováno v:
Chemische Berichte. 121:465-469
Mit Hilfe von 1H- und 13C-NMR-Messungen in Losung (und im Festkorper) werden die Konformationen von 2-Diazo-1,3-diketonen (2a–f) mit sperrigen Resten untersucht. Investigation on the Conformation of 2-Diazo-1,3-diketones Conformational analyses of