Zobrazeno 1 - 10
of 15
pro vyhledávání: '"Horst Roeschert"'
Autor:
Klaus Juergen Przybilla, Thomas J. Lynch, Takanori Kudo, Natsumi Suehiro, Walter Spiess, Munirathna Padmanaban, Seiya Masuda, Horst Roeschert, Yoshiaki Kinoshita, Yuko Nozaki, Hiroshi Okazaki, Georg Pawlowski
Publikováno v:
Journal of Photopolymer Science and Technology. 7:461-472
Acetal based deep UV resists, AZ® DX series, are high performance, positive tone deep UV resists consisting of poly(3-methyl, 4- hydroxystyrene-co-4-hydroxystyrene) matrix resin, poly(N, O-acetal) dissolution inhibitor, bis(arylsulfonyl) diazomethan
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f22bb76c38e8a21f25b2d0595c352122
https://doi.org/10.2494/photopolymer.7.461
https://doi.org/10.2494/photopolymer.7.461
Publikováno v:
Macromolecules. 26:3862-3869
A three-dimensional cubic percolation field is proposed as a model for the behavior of amphiphilic resins in aqueous bases. From the statistics of this model it is found that the percolation parameter is linearly related to the degree of occupation o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fc4d3165db3b1ca0549d408b3378241e
https://doi.org/10.1021/ma00067a023
https://doi.org/10.1021/ma00067a023
Autor:
Francoise Vinet, Takanori Kudo, Horst Wengenroth, Natusmi Suehiro, Charles Le Cornec, Yoshiaki Kinoshita, Thomas J. Lynch, Seiya Masuda, Thierry Mourier, Yuko Nozaki, Horst Roeschert, John Kochan, Munirathna Padmanaban, Klaus Juergen Przybilla, Hiroshi Okazaki, Gary C. Escher, Georg Pawlowski, Setha G. Olson, Walter Spiess
Publikováno v:
Advances in Resist Technology and Processing XI.
This contribution emphasizes resist application site by communicating lithographic results for AZ DX 46, obtained using the GCA XLS 7800/31 stepper, NA equals 0.53, equipped with krypton fluoride excimer laser ((lambda) equals 248 nm), model 4500 D,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e583d9070ea75e2d3083b2e0cd146a61
https://doi.org/10.1117/12.175402
https://doi.org/10.1117/12.175402
Autor:
Yuko Nozaki, Thomas J. Lynch, Munirathna Padmanaban, Yoshiaki Kinoshita, Horst Wengenroth, Horst Roeschert, Natusmi Suehiro, Takanori Kudo, Walter Spiess, Klaus Juergen Przybilla, Seiya Masuda, Hiroshi Okazaki, Georg Pawlowski
Publikováno v:
Advances in Resist Technology and Processing XI.
AZ DX series are chemically amplified, three component resists based on a poly(4-hydroxystyrene-co-3-methyl-4-hydroxystyrene) matrix resin, a poly(N,O-acetal) dissolution inhibitor, and a bis(arylsulfonyl)diazomethane acid generator. The previously d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5680324fe9cf5dd682ee8c7754e30f1a
https://doi.org/10.1117/12.175392
https://doi.org/10.1117/12.175392
Publikováno v:
Advances in Resist Technology and Processing X.
This paper describes some physico-chemical properties and early lithographic results of deep- UV resist systems containing (alpha) -hydroxymethylbenzoin sulfonic acid esters as photoacid generating compounds. (alpha) -Hydroxymethylbenzoin sulfonic ac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::519d6d6f79d6bfc93a9b3f3a640c8388
https://doi.org/10.1117/12.154769
https://doi.org/10.1117/12.154769
Autor:
Takanori Kudo, Yoshiaki Kinoshita, Horst Roeschert, Munirathna Padmanaban, Klaus Juergen Przybilla, Hiroshi Okazaki, Seiya Masuda, Georg Pawlowski, Natusmi Suehiro, Walter Spiess
Publikováno v:
Advances in Resist Technology and Processing X.
This paper describes a newly developed acetal-based positive tone deep UV photoresist called DX 46. The material consists of a 4-hydroxystyrene/4-hydroxy-3-methylstyrene copolymer, a polymeric dissolution inhibitor, and a bleachable diazo-photoactive
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e262e66b88c64f6dd0562ba0eac9a66d
https://doi.org/10.1117/12.154803
https://doi.org/10.1117/12.154803
Autor:
Walter Spiess, Horst Roeschert, Charlotte Eckes, Hiroshi Okazaki, Takanori Kudo, Horst Wengenroth, Georg Pawlowski, Munirathna Padmanaban, Hajime Endo, Natusmi Suehiro, Klaus Juergen Przybilla, Yoshiaki Kinoshita, Seiya Masuda
Publikováno v:
Advances in Resist Technology and Processing X.
This paper presents some methods for the investigation of delay time I3 induced effects typical of an advanced acetal-based photoresist, and strategies to improve the latent image stability. Dissolution rate monitoring was used to investigate the inc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9821c626c8864b2703f981d23244e587
https://doi.org/10.1117/12.154753
https://doi.org/10.1117/12.154753
Publikováno v:
Advances in Resist Technology and Processing X.
A scaling law derived from percolation theory for thedissolution of phenolic resins in aqueous base is tested and confirmed on seven groups of amphiphilic resins. The scaling law can be presented in thedimensionless formlog(R/R ) = 2 log[(p p)/(1 —
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ada9f9b2ad1a12958b3b98fba6037eb
https://doi.org/10.1117/12.154792
https://doi.org/10.1117/12.154792
Hexafluoroacetone in resist chemistry: a versatile new concept for materials for deep-UV lithography
Publikováno v:
SPIE Proceedings.
Starting from general arguments on hexafluoroacetone chemistry, an exploratory investigation of the utility of this new type of resist chemistry is presented. The 2- hydroxyhexafluoroisopropyl-group (HHFIP) proves to be comparable to phenolic groups
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8124ea4e8501a69992583dcf43f8561
https://doi.org/10.1117/12.59744
https://doi.org/10.1117/12.59744
Autor:
Georg Pawlowski, Horst Roeschert, Ralph R. Dammel, Walter Spiess, Winfried Meier, K. Kamiya, Charlotte Eckes, Klaus Juergen Przybilla
Publikováno v:
SPIE Proceedings.
Advanced negative photoresists for both KrF-excimer laser lithography (DN 21) and deep-UV broadband irradiation (DN 41) have been investigated. The materials are based on the well established chemistry of an acid-sensitive melamine derivative as the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4ff635c3cf15cd08eb7fca1a1356df95
https://doi.org/10.1117/12.59757
https://doi.org/10.1117/12.59757