Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Horst Röschert"'
Publikováno v:
Microelectronic Engineering. 21:267-270
Current state of process capabilities and performance items of a recently developed chemically amplified positive tone deep UV (DUV) resist is presented. The material is based on three components: an α, α-bis (arylsulfonyl) diazomethane as phtoacid
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a342c422054acbd05ab2470cecac4622
https://doi.org/10.1016/0167-9317(93)90070-l
https://doi.org/10.1016/0167-9317(93)90070-l
Autor:
Eva-Maria Peters, Karl Peters, Jürgen Carlsen, Hans Georg von Schnering, Horst Röschert, Helmut Quast
Publikováno v:
Chemische Berichte. 125:2591-2611
Syntheses, Structures, and Reactions of Phenylethynyl-Substituted Bicyclo[3.3.0]octanes[1] The bicyclo[3.3.0]octane-3,7-dione 5 adds phenylethynyl-cerium(III) dichloride to afford an almost quantitative yield of the 3,7-diols exo,exo-, exo,endo-, and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9e244d6ad71194e95ac622939172260a
https://doi.org/10.1002/cber.19921251134
https://doi.org/10.1002/cber.19921251134
Publikováno v:
Polymer Engineering & Science. 32:1516-1522
t-Butyloxycarbonyl (t-BOC) blocked compounds based on the protection of phenolic groups, e.g. poly-4-hydroxystyrene derivatives, Bisphenol A type dissolution inhibitors, or onium salt photoacid generators, have found widespread research interest for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::97a58cf3dcf68de62f0f33d0798445a0
https://doi.org/10.1002/pen.760322013
https://doi.org/10.1002/pen.760322013
Autor:
Rolf Janiak, Hans Georg von Schnering, Helmut Quast, Karl Peters, Horst Röschert, Thomas Herkert, Eva-Maria Peters, Jürgen Carlsen
Publikováno v:
Liebigs Annalen der Chemie. 1992:495-511
Stereochemistry of the Addition of Phenylmetal Reagents to Bicyclo[3.3.0]octanediones and -octadienediones. — Synthesis of Phenyl-Substituted Bicyclo[3.3.0]octadienes Conjugate addition of dilithium diphenylcyanocuprate is observed only on one side
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d50d9bec756cb122ae11fbed88de228e
https://doi.org/10.1002/jlac.199219920188
https://doi.org/10.1002/jlac.199219920188
Publikováno v:
Advanced Materials. 4:239-242
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fff0ed449b2f4a38f95b69a3e5dabb2d
https://doi.org/10.1002/adma.19920040318
https://doi.org/10.1002/adma.19920040318
Publikováno v:
Journal of Photopolymer Science and Technology. 5:85-92
Some recent investigations on hexafluoroacetone (HFA) have revealed that this reagent offers a variety of interesting aspects and potential applications for new photoresist products. The 2- hydroxyhexafluoroisopropyl group (HHFIP), obtained via conde
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14bf86c6976fd087d22e6c8fc14c58fa
https://doi.org/10.2494/photopolymer.5.85
https://doi.org/10.2494/photopolymer.5.85
Publikováno v:
Journal of Photopolymer Science and Technology. 5:55-66
The chemistry and some performance aspects of a novel chemically amplified positive tone photoresist system sensitive to KrF excimer laser radiation is described. The material consists of three components: an α, α-bisarylsulfonyl diazomethane as th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c938c9c7721f65d85e5b68ac4f7db5b7
https://doi.org/10.2494/photopolymer.5.55
https://doi.org/10.2494/photopolymer.5.55
Autor:
Winfried Meier, Ralph R. Dammel, Charlotte Dammel, Klause-Jürgen Przybilla, Charlet R. Lindley, Walter Spiess, Horst Röschert, Georg Pawlowski
Publikováno v:
Microelectronic Engineering. 13:29-32
Substituted poly(4-hydroxystyrene)s provide an interesting source of film forming, deep UV transparent, aqueous alkaline developable polymers with a broad potential for modification of their chemical and physical properties. After a review of their s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2dc9b62b9a3aca429d0b4730ded13196
https://doi.org/10.1016/0167-9317(91)90041-b
https://doi.org/10.1016/0167-9317(91)90041-b
Publikováno v:
Journal of Photopolymer Science and Technology. 4:421-432
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f74d914297ec8ee068703939bb745cd
https://doi.org/10.2494/photopolymer.4.421
https://doi.org/10.2494/photopolymer.4.421
Autor:
Georg Pawlowski, Horst Röschert, H.-J. Merrem, P. Wilharm, Charlet R. Lindley, Ralph R. Dammel
Publikováno v:
Microelectronic Engineering. 11:491-495
Multifunctional a - diazo - β - ketoesters (DKE) 6 provide an attractive source of deep UV sensitive photoactive compounds with a broad potential for modification of their chemical, physical and lithographic properties. In combination with highly tr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e3a0d95bb31880d3da7c263fa483558
https://doi.org/10.1016/0167-9317(90)90157-o
https://doi.org/10.1016/0167-9317(90)90157-o