High-density inductively coupled plasma etching of GaAs/AlGaAs in BCl3/Cl2/Ar: A study using a mixture design experiment.

Autor: Agarwala, Sambhu, Horst, Scott C., King, Oliver, Wilson, Rick, Stone, Dennis, Dagenais, Mario, Chen, Y. J.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1998, Vol. 16 Issue 2, p511-514, 4p