Výsledky vyhledávání - "Hoon-Sang Choi"

48.4: Development of High-Contrast CRT Based on Nano Pigment Screen Technique

Autor: Chilhee Chung, Jae-Ik Lim, Joonsoo Kwon, Hoon-Sang Choi, Myeong-cheol Kim, K. H. Lee, Sooa Kim, Jeong-Soo Lee

Publikováno v: SID Symposium Digest of Technical Papers. 36:1532

We have developed the NPSCN (Nano Pigment Screen) technique, a new style phosphor screen and successfully applied it to the CRT TVs. The technique significantly improved contrast, color gamut and body color in comparison to the previous CRTs without

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a472c75314c14ce2589a71be5afc1091
https://doi.org/10.1889/1.2036302

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High -Density Quantum Nanostructure for Single Mode Distributed Feedback Semiconductor Lasers by One-Step Growth

Autor: Jong-Hyeob Baek, Young-Ju Park, Chang-Sik Son, In-Hoon Choi, Yong Tae Kim, Hoon-Sang Choi, Seong-Il Kim

Publikováno v: Korean Journal of Materials Research. 13:485~490-485~490

We have developed a new way of the constant growth technique to maintain a grating height of originally-etched V-groove of submicron gratings up to 1.5 thickness by a low pressure metalorganic chemical vapor deposition. The constant growth technique

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a04c7643498b84fd9a32d7670c1e5f26
https://doi.org/10.3740/mrsk.2003.13.8.485

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Growth and Characteristics of IrO2 Thin Films for Application as Bottom Electrodes of Ferroelectric Caplacitors

Autor: Do-Young Kim, Jang-Hyeok Lee, Hoon-Sang Choi, In-Hoon Choi, Jae-Sung Hur, Yu-Min Jang

Publikováno v: Korean Journal of Materials Research. 13:69~73-69~73

In this work, thin films as bottom electrode of ferroelectric capacitors were deposited and characterized. The films deposited in the conditions of 25, 40 and 50% oxygen ambient by sputtering method were annealed at 600, 700 and , respectively. It wa

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9976decdef4f5d78985a47f92674bd3a
https://doi.org/10.3740/mrsk.2003.13.2.069

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Characteristics of the SrBi2Nb2O9 Thin Films Deposited by RF Magnetron Sputtering with Controlling of Bi Contents

Autor: Hyun-Ju Sung, Jong-Han Lee, Hoon-Sang Choi, Chang-Sik Son, Geun-Sik Lim, Young Suk Kwon, In-Hoon Choi

Publikováno v: Korean Journal of Materials Research. 12:962~966-962~966

The (SBN) thin films were deposited with / (SNO) and targets by co-sputtering method. For the growth of SBN thin films, we adopted the various power ratios of two targets; the power ratios of the SNO target to target were 100 W : 20 W, 100 W : 25 W,

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::8ed5d5fc26621404168f38618feffce7
https://doi.org/10.3740/mrsk.2002.12.12.962

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