Zobrazeno 1 - 10
of 105
pro vyhledávání: '"Hoogstrate, A.M."'
Publikováno v:
In CIRP Annals - Manufacturing Technology 2008 57(1):349-352
Publikováno v:
In Journal of Materials Processing Tech. 2007 191(1):335-338
Publikováno v:
In CIRP Annals - Manufacturing Technology 2006 55(1):339-342
Publikováno v:
In Wear 2005 259(1):84-94
Publikováno v:
In CIRP Annals - Manufacturing Technology 2005 54(1):281-284
Publikováno v:
In Journal of Materials Processing Tech. 2004 149(1):43-49
Publikováno v:
In Journal of Materials Processing Tech. 2004 149(1):30-36
Publikováno v:
In CIRP Annals - Manufacturing Technology 2004 53(1):251-254
Publikováno v:
In CIRP Annals - Manufacturing Technology 2002 51(1):263-266
Autor:
Sligte, E. te, Koster, N.B., Molkenboer, F.T., Walle, P. van der, Muilwijk, P.M., Mulckhuyse, W.F.W., Oostdijck, B.W., Hollemans, C.L., Nijland, B.A.H., Kerkhof, P.J., Putten, M. van, Hoogstrate A.M., Deutz, A.F.
Publikováno v:
Kasprowicz, B.S.Buck, P.D., Photomask Technology, 12 September 2016, San José CA, USA
TNO is building EBL2: a laboratory EUV exposure system capable of operating at high broad band EUV powers and intensities, in which XPS analysis of exposed samples is possible without breaking vacuum. Its goal is to accelerate the development and tes
Externí odkaz:
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http://resolver.tudelft.nl/uuid:27d9489f-a0bf-42ef-976c-3e0d38d534f5
http://resolver.tudelft.nl/uuid:27d9489f-a0bf-42ef-976c-3e0d38d534f5
