Composite SiO 2/TiO 2 and amine polymer/TiO 2 nanoparticles produced using plasma-enhanced chemical vapor deposition

Autor: Shearer, Jeffrey C., Fisher, Mary J., Hoogeland, D., Fisher, Ellen R.

Publikováno v: In Applied Surface Science 2010 256(7):2081-2091

Plasma-Assisted ALD TiN/Al2O3 stacks for MIMIM Trench Capacitor Applications

Autor: Hoogeland, D., Jinesh, K.B., Voogt, F.C., Besling, W.F.A., Lamy, Y., Roozeboom, F., Sanden, van de, M.C.M., Kessels, W.M.M., Gendt, de, S.

Publikováno v: Atomic layer deposition applications 5 : Proceedings of the 5th Symposium on Atomic Layer Deposition as part of the 216th Meeting of the Electrochemical Society 5-7 October 2009, Vienna, 389-397
STARTPAGE=389;ENDPAGE=397;TITLE=Atomic layer deposition applications 5 : Proceedings of the 5th Symposium on Atomic Layer Deposition as part of the 216th Meeting of the Electrochemical Society 5-7 October 2009, Vienna

In this paper we report on the overall plasma-assisted ALD processes of Al2O3 and TiN conducted in a single reactor chamber and at a single temperature (340 oC). The individual Al2O3 and TiN films in the stack were consecutively deposited in such a w

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2d451fbd5c032f3665938f0ed26bb10a
https://doi.org/10.1149/1.3205073

Composite SiO2/TiO2 and amine polymer/TiO2 nanoparticles produced using plasma-enhanced chemical vapor deposition

Autor: Shearer, Jeffrey C.¹, Fisher, Mary J.¹, Hoogeland, D.², Fisher, Ellen R.¹ Ellen.Fisher@colostate.edu

Publikováno v: Applied Surface Science. Jan2010, Vol. 256 Issue 7, p2081-2091. 11p.