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Publikováno v:
Extended Abstracts of the 2005 International Conference on Solid State Devices and Materials.
Publikováno v:
Electrochemical and Solid-State Letters. 11:H124
A dual-metal-gate stack with an interfacial layer of aluminum nitride and a top layer of iridium was investigated. By controlling the thickness and composition of aluminum nitride, we can effectively control the work function of the metal gate stack.