Zobrazeno 1 - 10
of 20
pro vyhledávání: '"Hoijoon Kim"'
Autor:
Eun Hye Kim, Do Hee Lee, Tae Jun Gu, Hyobin Yoo, Yamujin Jang, Jaemo Jeong, Hyun-Woo Kim, Seog-Gyun Kang, Hoijoon Kim, Heesoo Lee, Kyu-Jin Jo, Beom Ju Kim, Jin Wook Kim, Seong Hyun Im, Chang Seok Oh, Changgu Lee, Ki Kang Kim, Cheol-Woong Yang, Hyoungsub Kim, Youngkuk Kim, Philip Kim, Dongmok Whang, Joung Real Ahn
Publikováno v:
Nano Letters. 23:3054-3061
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::22fbf610f046e96caee4f8883f37a0cc
https://doi.org/10.1021/acs.nanolett.3c00546
https://doi.org/10.1021/acs.nanolett.3c00546
Autor:
Mann Ho Cho, Kwangsik Jeong, Eunha Lee, Hoijoon Kim, Taejin Park, Jung-Hwa Kim, Hyangsook Lee, Yeonchoo Cho, Wonsik Ahn, Sungwoo Hwang, Heegu Kim, Hyoungsub Kim, Mirine Leem
Publikováno v:
Materials Today. 47:38-44
Although solid-state phase transformations through chemical reaction with the surrounding environment are important in the field of materials science, the atomic-level dynamics at reacting surfaces have been difficult to observe directly. Herein, we
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dad04bbc08bfe31b04785b4181ab39ea
https://doi.org/10.1016/j.mattod.2021.02.009
https://doi.org/10.1016/j.mattod.2021.02.009
Autor:
Seongjun Park, Changmin Lee, Mirine Leem, Seongjae Park, Seong-Jun Jeong, Hyangsook Lee, Wonsik Ahn, Eunha Lee, Hoijoon Kim, Taejin Park, Yunseok Kim, Hyoungsub Kim
Publikováno v:
Thin Solid Films. 673:112-118
For the fabrication of high-performance top-gated MoS2 transistors, a uniform atomic layer deposition (ALD) of an ultrathin high-k gate dielectric film without abnormal leakage paths on a MoS2 channel is required. In this study, we fabricated a ~5.2
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e7d23a9c0bb31f7d70b85aa0b4dbc87
https://doi.org/10.1016/j.tsf.2019.01.039
https://doi.org/10.1016/j.tsf.2019.01.039
Autor:
Jin-Bum Kim, Hyangsook Lee, Hoijoon Kim, Taejin Park, Hyunjung Shin, Changdeuck Bae, Eunha Lee, Mirine Leem, Hyoungsub Kim, Wonsik Ahn
Publikováno v:
CrystEngComm. 21:478-486
Non-equilibrium fractal growth of MoS2 was induced by establishing an extremely Mo rich chemical vapor deposition (CVD) environment using a rapid heating rate in a confined reaction space. In addition, a detailed shape evolution mechanism was suggest
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::127d921e15ae64671e416cd9ef69380a
https://doi.org/10.1039/c8ce01952e
https://doi.org/10.1039/c8ce01952e
Publikováno v:
Journal of Materials Chemistry C. 6:9394-9398
We report a novel patterning method using oxygen plasma treatment for flexible and transparent Ag nanowire electrodes. Using a dry film photoresist as a solid-state film-type photoresist, Ag nanowires were selectively oxidized under oxygen plasma tre
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::eccc838e02695a133e057fd9b0ad8425
https://doi.org/10.1039/c8tc02377h
https://doi.org/10.1039/c8tc02377h
Autor:
Hyoungsub Kim, Hoijoon Kim, Taejin Park, Eunha Lee, Jin-Bum Kim, Yong-Hoon Kim, Wonsik Ahn, Mirine Leem, Hyangsook Lee
Publikováno v:
The Journal of Physical Chemistry C. 121:27693-27699
Vertical MoO2/MoS2 core–shell structures were synthesized on an amorphous surface (SiO2) by chemical vapor deposition at a high heating rate using a configuration in which the vapor phase was confined. The confined reaction configuration was achiev
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cc44371f0f180da592df57e50aaf580f
https://doi.org/10.1021/acs.jpcc.7b08171
https://doi.org/10.1021/acs.jpcc.7b08171
Autor:
Seongheum Choi, Yunseok Kim, Kee-Won Kwon, Joon Uh, Hoijoon Kim, Taejin Park, Wonsik Ahn, Jin-Bum Kim, Hyoungsub Kim, Seong-Jun Jeong, Mirine Leem, Seongjun Park
Publikováno v:
RSC Advances. 7:884-889
Uniform deposition of high-k dielectrics on two-dimensional (2D) crystals is highly desirable for their use in future nano-electronic devices. Here, the surface coverage of the Al2O3 films grown by atomic layer deposition (ALD) was investigated on me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f32c10c28939dcacb274e94b551af833
https://doi.org/10.1039/c6ra24733d
https://doi.org/10.1039/c6ra24733d
Autor:
Hyangsook Lee, Seong-Jun Jeong, Yunseok Kim, Mirine Leem, Seongjae Park, Changmin Lee, Seongjun Park, Eunha Lee, Wonsik Ahn, Hyoungsub Kim, Hoijoon Kim, Taejin Park
Publikováno v:
Thin Solid Films. 721:138544
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::68d65bdcfb9d23d64d7ad74a925786bf
https://doi.org/10.1016/j.tsf.2021.138544
https://doi.org/10.1016/j.tsf.2021.138544
Autor:
Wonsik Ahn, Eunha Lee, Heesoo Lee, Hyangsook Lee, Mirine Leem, Hoijoon Kim, Taejin Park, Hyoungsub Kim
Publikováno v:
physica status solidi (RRL) – Rapid Research Letters. 15:2000533
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8a73bab23af844af02119e0325ecb772
https://doi.org/10.1002/pssr.202000533
https://doi.org/10.1002/pssr.202000533
Publikováno v:
Applied Surface Science. 535:147684
In this study, the thermal sulfidation characteristics of two amorphous nonstoichiometric Mo-oxide (MoO3−x) films were investigated that were deposited using e-beam evaporation of MoO3 and MoO2 powders. It was observed that evaporation of MoO2 prod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e851ef72b15db1b2d5a607e932589ab0
https://doi.org/10.1016/j.apsusc.2020.147684
https://doi.org/10.1016/j.apsusc.2020.147684