Zobrazeno 1 - 10
of 152
pro vyhledávání: '"Hohn, O."'
Akademický článek
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Akademický článek
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Autor:
Nguyen-Hoai, T1, Hohn, O2, Vu, M D1, Baldenhofer, G1, Sayed Ahmed, M S1, Dörken, B1, Norley, S2, Lipp, M3, Pezzutto, A1, Westermann, J1
Publikováno v:
Cancer Gene Therapy. Dec2012, Vol. 19 Issue 12, p880-887. 8p. 6 Graphs.
Akademický článek
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Autor:
Tang, M., Ge, J., Wong, J., Ling, Z.P., Huber, M.R., Zhang, Z., Dörr, M., Dippell, T., Hohn, O., Wohlfart, P., Aberle, A.G., Mueller, T.
29th European Photovoltaic Solar Energy Conference and Exhibition; 966-968
This paper describes the development of a hydrogen plasma etching process to substitute the commonly applied hydrofluoric acid dip prior to surface passivation of crystal
This paper describes the development of a hydrogen plasma etching process to substitute the commonly applied hydrofluoric acid dip prior to surface passivation of crystal
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::734fe66c9825a021af95bb562359de01
Autor:
Ge, J., Tang, M., Wong, J., Zhang, Z., Dippell, T., Dörr, M., Hohn, O., Huber, M.R., Wohlfart, P., Aberle, A.G., Mueller, T.
29th European Photovoltaic Solar Energy Conference and Exhibition; 1032-1035
In this paper, we present an alternative method of depositing a high-quality passivation film for heterojunction silicon wafer solar cells. The deposition of hydrogenat
In this paper, we present an alternative method of depositing a high-quality passivation film for heterojunction silicon wafer solar cells. The deposition of hydrogenat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::235013d90ac97a99e514739188222739
Autor:
Zhang, Z., Dippell, T., Huber, M.R., Dörr, M., Hohn, O., Ge, J., Tang, M., Wong, J., Mueller, T., Wohlfart, P.
29th European Photovoltaic Solar Energy Conference and Exhibition; 1239-1242
SINGULAR has shown excellent performance as a commercial production platform, which has so far been used for single-sided plasma deposition of functional single layers
SINGULAR has shown excellent performance as a commercial production platform, which has so far been used for single-sided plasma deposition of functional single layers
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::94d91faed70b432968b965b15c7b5c50
Autor:
Roos, B.F.P., Dippell, T., Hohn, O., Wohlfart, P., Beier, B., Veith-Wolf, B., Siebert, M., Dullweber, T.
27th European Photovoltaic Solar Energy Conference and Exhibition; 1684-1687
SINGULAR is a multi chamber PECVD production tool, which allows depositing single and multi layers of different materials on silicon solar wafers using inductively coup
SINGULAR is a multi chamber PECVD production tool, which allows depositing single and multi layers of different materials on silicon solar wafers using inductively coup
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::66d5bad0d71e964730652d15110092a2
24th European Photovoltaic Solar Energy Conference, 21-25 September 2009, Hamburg, Germany; 1665-1668
SINGULUS TECHNOLOGIES AG presents the SINGULAR, a novel inline production tool prepared for the future silicon-cell production. The central con
SINGULUS TECHNOLOGIES AG presents the SINGULAR, a novel inline production tool prepared for the future silicon-cell production. The central con
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ccf7a68f76991674a2d0fd25595fbffe
Autor:
Weber, Th., Weckenbrock, M., Balser, M., Schmidt, L., Jagutzki, O., Arnold, W., Hohn, O., Schoffler, M., Arenholz, E., Young, T., Osipov, T., Foucar, L., Fanis, A. De, Muino, R. Diez, Schmidt-Bocking, H., Cocke, C.L., Prior, M.H., Dorner, R.
Publikováno v:
Weber, Th.; Weckenbrock, M.; Balser, M.; Schmidt, L.; Jagutzki, O.; Arnold, W.; et al.(2003). Auger electron emission from fixed in space CO. Physical Review Letters, 90. Lawrence Berkeley National Laboratory: Lawrence Berkeley National Laboratory. Retrieved from: http://www.escholarship.org/uc/item/1xf4s2qp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______325::608037d84682332581a7280021cea638
http://www.escholarship.org/uc/item/1xf4s2qp
http://www.escholarship.org/uc/item/1xf4s2qp