Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Hoe-sik Chung"'
Autor:
Dong Young Oh, Hoe Sik Chung
Publikováno v:
ChemInform. 24
Stereoselective preparation of 1-phenylseleno-1,3-butadiene derivatives 3 is described via chemoselective transmetalation of zirconacyclopentadienes 1 using phenylselenenyl bromide 4 .
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d4720b787d8ab24032211d3622634912
https://doi.org/10.1002/chin.199302238
https://doi.org/10.1002/chin.199302238
Autor:
Young-Ho Kim, Sang Mun Chon, Yong-Hoon Kim, Sangwoong Yoon, Hoe-sik Chung, Yasuyuki Nakajima, Ken-Ichi Mizusawa, Tomoyuki Enomoto, Keisuke Nakayama
Publikováno v:
Advances in Resist Technology and Processing XX.
A frequent problem encountered by photoresists during the manufacturing of semiconductor device is that activating radiation is reflected back into the photoresist by the substrate. So, it is necessary that the light reflection is reduced from the su
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1063302bbf4bb01fabc7f3d57b4a6fde
https://doi.org/10.1117/12.485060
https://doi.org/10.1117/12.485060
Autor:
NamHee Yoo, Sangwoong Yoon, Young-sun Kim, Hoe-sik Chung, Je-Eung Park, Jin-hang Jung, KwangSoek Choi
Publikováno v:
Advances in Resist Technology and Processing XVII.
To reach the sub-0.3 micrometer contact hole pattern by i-line lithography, some advanced technology was introduced such as Phase Shift Mask (PSM) and/or photoresist (PR) flow process. It may be possible that the contact hole is patterned with 0.18 m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eecccd0053c6ef0060bb525c8ead1284
https://doi.org/10.1117/12.388334
https://doi.org/10.1117/12.388334
Autor:
Hoe Sik Chung, Dong Young Oh
Publikováno v:
Tetrahedron Letters. 33:5097-5098
Stereoselective preparation of 1-phenylseleno-1,3-butadiene derivatives 3 is described via chemoselective transmetalation of zirconacyclopentadienes 1 using phenylselenenyl bromide 4 .
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e89c88474e6615b9ddf8d0f69d33fca2
https://doi.org/10.1016/s0040-4039(00)61199-1
https://doi.org/10.1016/s0040-4039(00)61199-1
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