Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Hladkovskyi V. V."'
Autor:
Hladkovskyi V. V., Fedorovich O. A.
Publikováno v:
Tekhnologiya i Konstruirovanie v Elektronnoi Apparature, Iss 4-5, Pp 40-44 (2017)
The article presents the research results on the influence of the amount of oxygen in a mixture with sulfur hexafluoride on the rate and anisotropy of the silicon etching in the plasma-chemical reactor with the controlled magnetic field. The etching
Externí odkaz:
https://doaj.org/article/13dd9ee241494fc0ae49bce848d34317
Autor:
Fedorovich, O. A., Hladkovskyi, V. V., Polozov, B. P., Voitenko, L. M., Kostin, E. G., Rokitskyi, A. A., Oleksandr Oberemok
Publikováno v:
Scopus-Elsevier
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::3b6561666c6ef55c499d43bf650c97be
http://www.scopus.com/inward/record.url?eid=2-s2.0-85065452861&partnerID=MN8TOARS
http://www.scopus.com/inward/record.url?eid=2-s2.0-85065452861&partnerID=MN8TOARS
