Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Hitoo Iwasa"'
Publikováno v:
Open Physics, Vol 7, Iss 2, Pp 227-231 (2009)
The local photovoltage of the pn-junction single-crystalline silicon solar cells observed by spot light scanning gradually decreases in the vicinity of edges. The energy conversion efficiency is increased by shadowing the edge regions where the local
Publikováno v:
Applied Surface Science. 254:3667-3671
3C–SiC(0 0 1) surfaces are considerably rough with the roughness root mean square value (Rms) of 1.3 nm, but the surfaces become considerably smooth (i.e., Rms of 0.5 nm) by heat treatment in pure hydrogen at 400 °C. Two-step nitric acid (HNO3) ox
Autor:
Yueh-Ling Liu, Shigeki Imai, Masao Takahashi, Hikaru Kobayashi, Naozumi Fujiwara, Hitoo Iwasa
Publikováno v:
Surface Science. 600:1165-1169
A Si cleaning method has been developed by use of potassium cyanide (KCN) dissolved in methanol. When silicon dioxide (SiO2)/Si(1 0 0) specimens with 1014 atom/cm2 order copper (Cu) contaminants are immersed in 0.1 M KCN solutions of methanol at 25
Publikováno v:
Solid State Communications. 137:263-267
Absract Hydrogen cyanide (HCN) aqueous solutions are found to possess a great ability of removal of copper contaminants on Si as well as a Si defect passivation effect. Copper (Cu) contaminants of 10 13 cm −2 order concentrations can be reduced bel
Publikováno v:
Surface Science. 547:275-283
Spectroscopic and electrical properties of ultrathin silicon dioxide (SiO2) layers formed with nitric acid have been investigated. The leakage current density of the as-grown SiO2 layers of 1.3 nm thickness is high. The leakage current density is gre
Publikováno v:
Journal of Applied Physics. 94:7328-7335
Ultrathin silicon dioxide (SiO2) layers with excellent electrical characteristics can be formed using the nitric acid oxidation of Si (NAOS) method, i.e., by immersion of Si in nitric acid (HNO3) solutions. The SiO2 layer formed with 61 wt % HNO3 at
Publikováno v:
Surface Science. 542:244-252
Cyanide treatment, which includes the immersion of Si in KCN solutions followed by a rinse, effectively passivates interface states at Si/SiO 2 interfaces by the reaction of CN − ions with interface states to form Si–CN bonds. X-ray photoelectron
Autor:
Hitoo Iwasa
Publikováno v:
SHINKU. 6:228-238
Publikováno v:
Journal of the Mass Spectrometry Society of Japan. 1959:48-57
Publikováno v:
Japanese Journal of Applied Physics. 7:96