Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Hitendra Divecha"'
Autor:
Kyung-Youl Min, John Garcia, Christophe Suzor, Victor V. Boksha, Mitch Heins, Rafik Marutyan, Anthony Adamov, John Gookassian, Sergei Bakarian, Gurgen Lachinyan, Hitendra Divecha, Bob Pack, Dean Frazier, Brian Gordon, Dan White, Brian Dillon
Publikováno v:
Design and Process Integration for Microelectronic Manufacturing III.
There is a growing realization of the need for highly integrated solutions enabled by new bi-directional data 'pipes' between design and manufacturing. Traditional EDA applications should be able to communicate and collaborate with yield analysis sof
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2feb8b6b5ef1bbbf5f1bd206a9b821e6
https://doi.org/10.1117/12.600261
https://doi.org/10.1117/12.600261
Autor:
Patrick M. Martin, Kory Goldammer, Chris Progler, Zhiziang Jin, Kurt Davis, Brian Dillon, Yuan Zhang, R. Scott Mackay, Sergei Bakarian, Karen Martirosyan, Rafik Marutyan, Gary Green, Young Ham, Hitendra Divecha, Victor V. Boksha, Mitch Heins
Publikováno v:
Design and Process Integration for Microelectronic Manufacturing III.
Mask manufacturing rules are usually determined from assumed or experimentally acquired mask-manufacturing limits. These rules are then applied during resolution enhancement data treatment to guide and/or limit pattern correction strategies. This tec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f3af55d70cd874d5ceca21d9c9f28340
https://doi.org/10.1117/12.600730
https://doi.org/10.1117/12.600730