Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Hisashi Nakane"'
Publikováno v:
Journal of The Adhesion Society of Japan. 53:49-55
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::de421fa121296bed25fe46a8b424565d
https://doi.org/10.11618/adhesion.53.49
https://doi.org/10.11618/adhesion.53.49
Effect of Thermal Stress on Push-Out Strength of Rod-Cylinder Joints Bonded with Inorganic Adhesives
Publikováno v:
The Proceedings of the Materials and Mechanics Conference. 2021:OS1102
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7841600751da52d6ff80f27e833d7ff1
https://doi.org/10.1299/jsmemm.2021.os1102
https://doi.org/10.1299/jsmemm.2021.os1102
Publikováno v:
The Proceedings of the Machine Design and Tribology Division meeting in JSME. :2A3-2
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c6fdac918ff9ccb901a9262527da94a2
https://doi.org/10.1299/jsmemdt.2018.18.2a3-2
https://doi.org/10.1299/jsmemdt.2018.18.2a3-2
Autor:
Kazuhito Sachimoto, Sanae Aoki, Tetsuya Kameyama, Kisato Tone, Kazuhiko Tanaka, Masanobu Mori, Toru Nonami, Hisashi Nakane
Publikováno v:
Journal of the Ceramic Society of Japan. 115:151-155
An acid resistant fluoroapatite coated titanium dioxide (FAp-TiO2) was synthesized by adding a fluoride ion (F-) to hydroxyapatite (HAp), in order to avoid dissolution of the HAp at an acidic atmosphere. In this study, the optimization of synthetic c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8776f5a4ffd47e198011c435f8bd5102
https://doi.org/10.2109/jcersj.115.151
https://doi.org/10.2109/jcersj.115.151
Publikováno v:
Chemistry Letters. 42:209-211
Hydroxyapatite coated on TiO2 for use as a photocatalyst for water purification was synthesized by using the superhydrophilicity of TiO2. The hydroxyapatite formed on TiO2 under UV irradiation with...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39780cdcf10d841f205e23b6a20e7348
https://doi.org/10.1246/cl.2013.209
https://doi.org/10.1246/cl.2013.209
Autor:
Shingo Asaumi, Hisashi Nakane
Publikováno v:
Journal of The Electrochemical Society. 137:2546-2549
This paper discusses an insoluble layer which forms on the photoresist surface by pre-exposure treatment. From an analytical result of used developer for pre-exposure treatment, we have found that TBP-NQD triester (triester of trihydroxybenzophenone
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1fbfba41e873e055ca160bfc9620274f
https://doi.org/10.1149/1.2086986
https://doi.org/10.1149/1.2086986
Autor:
Susumu Namba, Minoru Tsuda, Setsuko Oikawa, Mitsuo Yabuta, Kenjj Gamo, Hisashi Nakane, Nobufumi Atoda, Koichiro Hoh, Akira Yokota
Publikováno v:
Polymer Engineering and Science. 26:1148-1152
Dry developable resists comprised of poly(methyl isopropenyl ketone) (PMIPK) and 4-methyl-2,6-dI-(4′-azldoben-zylidene)-cyclohexanone-1 gave excellent results in SK lithography, i. e., high aspect ratio resist patterns with vertical walls were easi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cfb8e2ab415cc4dc92ab343ff5ca7d5b
https://doi.org/10.1002/pen.760261615
https://doi.org/10.1002/pen.760261615
Publikováno v:
Polymer Engineering and Science. 23:1050-1053
A new negative working photo resist for UV lithography has been produced based on poly(methylisopropenylketone). Its significant characteristic is a minimal swelling upon development, with resulting high resolution capability.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ce397a0cd229142ed6cf2556a9c87556
https://doi.org/10.1002/pen.760231815
https://doi.org/10.1002/pen.760231815
Publikováno v:
Kobunshi. 28:97-104
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b418c9e3fe659bbebfc1b4fefbfa04cd
https://doi.org/10.1295/kobunshi.28.97
https://doi.org/10.1295/kobunshi.28.97
Autor:
Setsuko Oikawa, Wataru Kanai, Mitsuo Yabuta, Minoru Tsuda, Ken-ichi Kashiwagi, Isamu Hijikata, Hisashi Nakane, Akira Yokota
Publikováno v:
Polymer Engineering and Science. 23:993-999
A dry developable negative working resist composition comprised of poly(methyl isopropenyl ketone) (PMIPK) and 4-methyl-2,6-di(4′-azido-benzylidene) cyclohexanone-1 was examined. The main photochemical product formed in the resist pattern was found
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a13aa76001235a812bd78df8eedee7cc
https://doi.org/10.1002/pen.760231804
https://doi.org/10.1002/pen.760231804