Zobrazeno 1 - 10
of 79
pro vyhledávání: '"Hisashi Nakagawa"'
Autor:
Junmi Tanaka, Hideo Tanaka, Nobuhisa Mizuki, Eiichi Nomura, Naoko Nomura, Masayuki Yamane, Tomonobu Hida, Yoshio Goshima, Hiroshi Hatano, Hisashi Nakagawa
Publikováno v:
International Journal of Ophthalmology, Vol 8, Iss 1, Pp 1-10 (2015)
AIM: To assess the efficacy of topical Semaphorin-3A (SEMA3A) in the treatment of allergic conjunctivitis. METHODS: Experimental allergic conjunctivitis (EAC) mice model induced by short ragweed pollen (SRW) in 4-week-old of BALB/c mice, mice were e
Externí odkaz:
https://doaj.org/article/228cecc7a4614dad87cb870c3a6c494d
Publikováno v:
Clinical Ophthalmology, Vol 2008, Iss Issue 2, Pp 457-459 (2008)
Takahiko Hayashi1, Misaki Ishioka2, Norihiko Ito1, Yoko Kato1, Hisashi Nakagawa3, Hiroshi Hatano4, Nobuhisa Mizuki11Department of Ophthalmology, Yokohama City University School of Medicine, Yokohama, Kanagawa, Japan; 2Ryogoku Eye Clinic, Tokyo, Japan
Externí odkaz:
https://doaj.org/article/a12230c98f4e4b63a0c4a08113563473
Autor:
Hisatoshi Kaneko, Hiroshi Hatano, Masami Konagaya, Nozomu Hanaoka, Tsuguto Fujimoto, Masaaki Kobayashi, Tetsuju Sekiryu, Hisashi Nakagawa, Kazufumi Ikuta
Publikováno v:
Japanese Journal of Infectious Diseases. 73:316-319
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a89035de886c56f2449a087b04080fe6
https://doi.org/10.7883/yoken.jjid.2020.034
https://doi.org/10.7883/yoken.jjid.2020.034
Publikováno v:
Cryogenics. 102:1-8
This work investigated sinters made of pure fine silver powders having nominal particle sizes of 0.07, 0.13 and 10.6 μm, using nitrogen gas adsorption, laser flash analysis and field emission-scanning electron microscopy. The goal was to improve the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14e58819b47744f287fb321bf19a7e2c
https://doi.org/10.1016/j.cryogenics.2019.07.001
https://doi.org/10.1016/j.cryogenics.2019.07.001
Autor:
Hisashi Nakagawa, Masami Konagaya, Hiroshi Hatano, Masaaki Kobayashi, Tsuguto Fujimoto, Tomoko Tsukahara-Kawamura, Hisatoshi Kaneko, Nozomu Hanaoka, Kazufumi Ikuta
Publikováno v:
Japanese journal of infectious diseases. 72(5)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bfc75a569d956a8c25cbfcb0e1e89e16
https://pubmed.ncbi.nlm.nih.gov/31366858
https://pubmed.ncbi.nlm.nih.gov/31366858
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
A new 2 nm rated Nylon filter was developed to have features required for lithography filtration process such as finer pore size, extended contact time for adsorption enhancement and updated cleanliness for faster start-up. The contact time is extend
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c5911ab9c37f6c75df2cb37295f389f9
https://doi.org/10.1117/12.2515163
https://doi.org/10.1117/12.2515163
Autor:
Tomoko Tsukahara-Kawamura, Masaaki Kobayashi, Nozomu Hanaoka, Masami Konagaya, Hisashi Nakagawa, Hiroshi Hatano, Hisatoshi Kaneko, Eiichi Uchio, Tsuguto Fujimoto
Publikováno v:
Journal of medical virology. 91(6)
Objective To compare and evaluate the sensitivity of a newly developed silver-amplified immunochromatography (SAI) kit with various immunochromatography (IC) kits for adenoviruses based on the detection limit (copies/test). Methods An SAI kit and fou
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::19d116aac83692390527d1282f2e9fc6
https://pubmed.ncbi.nlm.nih.gov/30659635
https://pubmed.ncbi.nlm.nih.gov/30659635
Autor:
Tomoki Nagai, Satoshi Dei, Akihiro Oshima, Gijsbert Rispens, Yasin Ekinci, Marieke Meeuwissen, Hisashi Nakagawa, Seiichi Tagawa, Seiji Nagahara, Yuichi Terashita, Kosuke Yoshihara, Yukie Minekawa, Takehiko Naruoka, Oktay Yildirim, Coen Verspaget, Raymond Maas, Elizabeth Buitrago, Gosuke Shiraishi, Rik Hoefnagels
Publikováno v:
Journal of Photopolymer Science and Technology. 29:475-478
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fdc8ef41ab284055a30d13986642f0f2
https://doi.org/10.2494/photopolymer.29.475
https://doi.org/10.2494/photopolymer.29.475
Autor:
Akihiro Oshima, Seiichi Tagawa, Hiroyuki Ide, Serge Biesemans, Kosuke Yoshihara, Yoshitaka Konishi, Danilo De Simone, Masafumi Hori, Teruhiko Moriya, Hayakawa Makoto, Hans-Jürgen Stock, Yuya Kamei, Kathleen Nafus, Ryo Aizawa, Ken Maruyama, Takahiro Shiozawa, Yoshihiro Kondo, Motoyuki Shima, Kazuhiro Takeshita, Michael A. Carcasi, Masashi Enomoto, Toru Kimura, Yukie Minekawa, Tomoki Nagai, Gosuke Shiraishi, Hideo Nakashima, Masayuki Miyake, Hisashi Nakagawa, Geert Vandenberghe, Keisuke Yoshida, Masaru Tomono, John S. Petersen, Balint Meliorisz, Takehiko Naruoka, Ryo Shimada, Seiji Nagahara, Satoshi Dei, Foubert Philippe
Publikováno v:
Advances in Patterning Materials and Processes XXXV.
Photosensitized Chemically Amplified ResistTM (PSCARTM) **2.0’s advantages and expectations are reviewed in this paper. Alpha PSCAR in-line UV exposure system (“Litho Enhancer”) was newly installed at imec in a Tokyo Electron Ltd. (TELTM)’s C
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::824dfca6e19a82aae0a388d175fc1216
https://doi.org/10.1117/12.2297498
https://doi.org/10.1117/12.2297498