Zobrazeno 1 - 10
of 238
pro vyhledávání: '"Hirscher, S"'
Publikováno v:
In Microelectronic Engineering 2002 61:351-355
Autor:
Hirscher, S. ∗, Kümmel, M., Kirch, O., Domke, W.-D., Wolter, A., Käsmaier, R., Buschbeck, H., Cekan, E., Chalupka, A., Chylik, A., Eder, S., Horner, C., Löschner, H., Nowak, R., Stengl, G., Windischbauer, T., Zeininger, M.
Publikováno v:
In Microelectronic Engineering 2002 61:301-307
Autor:
Hirscher, S ∗, Kaesmaier, R, Domke, W.-D, Wolter, A, Löschner, H, Cekan, E, Horner, C, Zeininger, M, Ochsenhirt, J
Publikováno v:
In Microelectronic Engineering 2001 57:517-524
Autor:
Loeschner, H., Stengl, G., Buschbeck, H., Chalupka, A., Lammer, G., Platzgummer, E., Vonach, H., Jager, de, P.W.H., Kaesmaier, R., Ehrmann, A., Hirscher, S., Wolter, A., Dietzel, A.H., Berger, R., Grimm, H., Terris, B.D., Bruenger, W.H., Adam, D., Boehm, M., Eichhorn, H., Springer, R., Butschke, J., Letzkus, F., Ruchhoeft, P., Wolfe, J.C., Engelstad, R.L.
Publikováno v:
Emerging Lithographic Technologies VI, Santa Clara, 2002, 595-606
STARTPAGE=595;ENDPAGE=606;TITLE=Emerging Lithographic Technologies VI, Santa Clara, 2002
STARTPAGE=595;ENDPAGE=606;TITLE=Emerging Lithographic Technologies VI, Santa Clara, 2002
Recent studies carried out with Infineon Technologies have shown the utility of Ion Projection Lithography (IPL) for the manufacturing of integrated circuits. In cooperation with IBM Storage Technology Division the patterning of magnetic films by res
Akademický článek
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Autor:
Xu, Wenli1,2 (AUTHOR), Li, Liangjun1 (AUTHOR) lilj@upc.edu.cn, Guo, Mengwei1,2 (AUTHOR), Zhang, Fuzhao1 (AUTHOR), Dai, Pengcheng1 (AUTHOR), Gu, Xin1 (AUTHOR), Liu, Dandan1 (AUTHOR), Liu, Tao3 (AUTHOR), Zhang, Kuitong3 (AUTHOR), Xing, Tao3 (AUTHOR), Wang, Muzhou3 (AUTHOR), Li, Zhi3 (AUTHOR), Wu, Mingbo1,2 (AUTHOR) wumb@upc.edu.cn
Publikováno v:
Angewandte Chemie. 11/13/2023, Vol. 135 Issue 46, p1-8. 8p.
Autor:
Lee, Kenny1 (AUTHOR), Corrigan, Nathaniel1,2 (AUTHOR) n.corrigan@unsw.edu.au, Boyer, Cyrille1,2 (AUTHOR) cboyer@unsw.edu.au
Publikováno v:
Angewandte Chemie. 10/26/2023, Vol. 135 Issue 44, p1-43. 43p.
Autor:
Lee, Seok J.1 (AUTHOR), Telfer, Shane G.1 (AUTHOR) s.telfer@massey.ac.nz
Publikováno v:
Angewandte Chemie. 10/26/2023, Vol. 135 Issue 44, p1-13. 13p.
Autor:
Senkovska, Irena1 (AUTHOR), Bon, Volodymyr1 (AUTHOR), Abylgazina, Leila1 (AUTHOR), Mendt, Matthias2 (AUTHOR), Berger, Jan3 (AUTHOR), Kieslich, Gregor3 (AUTHOR), Petkov, Petko4 (AUTHOR) ppetkov@chem.uni-sofia.bg, Luiz Fiorio, Jhonatan5 (AUTHOR), Joswig, Jan‐Ole5 (AUTHOR), Heine, Thomas5,6,7 (AUTHOR) thomas.heine@tu-dresden.de, Schaper, Larissa8 (AUTHOR), Bachetzky, Christopher9 (AUTHOR), Schmid, Rochus8 (AUTHOR) rochus.schmid@rub.de, Fischer, Roland A.3 (AUTHOR) roland.fischer@tum.de, Pöppl, Andreas2 (AUTHOR) poeppl@physik.uni-leipzig.de, Brunner, Eike9 (AUTHOR) eike.brunner@tu-dresden.de, Kaskel, Stefan1 (AUTHOR) stefan.kaskel@chemie.tu-dresden.de
Publikováno v:
Angewandte Chemie. 8/14/2023, Vol. 135 Issue 33, p1-47. 47p.
Autor:
Fisher, L. M., Kalinov, A. V., Savel'ev, S. E., Voltshin, I. F., Yampol'skii, V. A., LeBlanc, M. A. R., Hirscher, S.
Publikováno v:
Physica C: Superconductivity and its Applications; 1997, Vol. 278 Issue: 3 p169-179, 11p