Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Hiroyoshi Ando"'
Autor:
Takahito Nakayama, Noriaki Nakayamada, Kenji Ohtoshi, Victor Katsap, Rodney A. Kendall, Hidekazu Takekoshi, Seiichi Nakazawa, Hiroyoshi Ando, Kenichi Saito, Hideo Inoue, Tomohiro Iijima, Akihito Anpo, Yoshinori Kojima, Hirohito Anze, Rieko Nishimura, Takashi Kamikubo, Steven D. Golladay, Jun Yashima
Publikováno v:
SPIE Proceedings.
Many lithography candidates, such as ArF immersion lithography with double-patterning/double-exposure techniques, EUV lithography and nano-imprint lithography, show promising capability for 22-nm half-pitch generation lithography. ArF immersion litho
Autor:
Shusuke Yoshitake, Takashi Kamikubo, Noriaki Nakayamada, Kiyoshi Hattori, Hiroyoshi Ando, Tomohiro Iijima, Kenji Ohtoshi, Kenichi Saito, Ryoichi Yoshikawa, Shuichi Tamamushi, Rikio Tomiyoshi, Hitoshi Higurashi, Yoshiaki Hattori, Seiichi Tsuchiya, Masayuki Katoh, Kouichi Suzuki, Yuichi Tachikawa, Munehiro Ogasawara, Victor Katsap, Steven Golladay, Rodney Kendall
Publikováno v:
SPIE Proceedings.
Autor:
Hiromichi Hoshi, Morihisa Hoga, Hiroyoshi Ando, Nobuyuki Yoshioka, Seiichi Tsuchiya, Junji Hirumi
Publikováno v:
SPIE Proceedings.
The shortening of electron beam settling time is important for the shortening of writing time of variable-shaped beam (VSB) writers. The settling time is the time until the electron beam is deflected to a desired position, and is settled. In the case
Autor:
Iwasaki Teruo, Ken Iizumi, Hiroyoshi Ando, Toshiyuki Morimura, Norio Saitou, Masahide Okumura, Koji Nagata
Publikováno v:
SPIE Proceedings.
We propose a compensation method, which we call the active noise cancelation technique, to improve the pattern positioning accuracy in electron-beam (EB) lithography. This compensation method corrects pattern positioning error by eliminating EB vibra