Zobrazeno 1 - 10
of 34
pro vyhledávání: '"Hirotaka Tsuda"'
Autor:
Nobuya Nakazaki, Haruka Matsumoto, Soma Sonobe, Takumi Hatsuse, Hirotaka Tsuda, Yoshinori Takao, Koji Eriguchi, Kouichi Ono
Publikováno v:
AIP Advances, Vol 8, Iss 5, Pp 055027-055027-12 (2018)
Nanoscale surface roughening and ripple formation in response to ion incidence angle has been investigated during inductively coupled plasma etching of Si in Cl2, using sheath control plates to achieve the off-normal ion incidence on blank substrate
Externí odkaz:
https://doaj.org/article/2f2c87cf1479491f8e1e9d43e3e971dc
Autor:
Yong-Taik Kim, Hirokazu Kato, S. Inoue, Motofumi Komori, Hirotaka Tsuda, Kei Kobayashi, A. Mitra, K. Matasunaga, Hiroshi Tokue, Sachiko Kobayashi, Masanobu Saito, Tetsuro Nakasugi, T. Imamura, Wooyung Jung, Takeharu Motokawa, Tatsuhiko Higashiki, T. Komukai, Kazuya Fukuhara, J. Cho, Masamitsu Itoh, Masayuki Hatano, K. Takahata, Shingo Kanamitsu, Takuya Kono, Kohji Hashimoto
Publikováno v:
2018 IEEE International Electron Devices Meeting (IEDM).
We developed a nanoimprint lithography (NIL) technology including NIL system, template and resist process for half pitch (hp) 14 nm direct pattering. The latest NIL system NZ2C shows the mix and match overlay (MMO) of 3.4 nm ( $3\sigma$ ) and the tem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e8e744f518046f1bb7c5a2041b9f1608
https://doi.org/10.1109/iedm.2018.8614578
https://doi.org/10.1109/iedm.2018.8614578
Autor:
Motofumi Komori, Takuya Kono, Hirotaka Tsuda, Wooyung Jung, Tetsuro Nakasugi, Hirokazu Washida
Publikováno v:
Novel Patterning Technologies 2018.
Nanoimprint lithography (NIL) is regarded as one of the candidates for next generation lithography toward singlenanometer manufacturing. Among the wide variety of imprint methods, Jet and Flash Imprint Lithography (J-FIL) process is the most suitable
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c4121740818bee736231a0157ccf238a
https://doi.org/10.1117/12.2297332
https://doi.org/10.1117/12.2297332
Autor:
Tetsuro Nakasugi, Ji-Young Im, Kazuhiro Washida, Hirotaka Tsuda, Takuya Kono, Sachiko Kobayashi, Kyoji Yamashita, Motofumi Komori
Publikováno v:
Novel Patterning Technologies 2018.
Technologies for pattern fabrication using imprint process are being developed for various devices. Nanoimpirnt lithography (NIL) is an attractive and promising candidate for its pattern fidelity toward finer device fabrication without using double p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0cf30ba4fc67be5f586b47efe20c7d6a
https://doi.org/10.1117/12.2297361
https://doi.org/10.1117/12.2297361
Autor:
Ji-Young Im, Hirotaka Tsuda, Ryoichi Inanami, Kyoji Yamashita, Takuya Kono, Sachiko Kobayashi, Shimon Maeda, Motofumi Komori, Kazuhiro Washida
Publikováno v:
SPIE Proceedings.
Technologies for pattern fabrication using imprint process are being developed for various devices. Nanoimpirnt lithography (NIL) is an attractive and promising candidate for its pattern fidelity toward finer device fabrication without using double p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7892889f8e784b3bc5b2e00a5e987ee7
https://doi.org/10.1117/12.2258172
https://doi.org/10.1117/12.2258172
Publikováno v:
Hyomen Kagaku. 34:528-534
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::02358f0f75e78947b9682fc30e0587d7
https://doi.org/10.1380/jsssj.34.528
https://doi.org/10.1380/jsssj.34.528
Autor:
Hirotaka Tsuda, Koji Eriguchi, Kouichi Ono, Haruka Matsumoto, Nobuya Nakazaki, Yoshinori Takao
Publikováno v:
Applied Physics Letters. 109(20)
Effects of initial roughness on the evolution of plasma-induced surface roughness have been investigated during Si etching in inductively coupled Cl[2] plasmas, as a function of rf bias power or ion incident energy in the range Ei ≈ 20–500 eV. Ex
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f0c7b01c9b32dd80abfb67c4995128d7
http://hdl.handle.net/2433/217469
http://hdl.handle.net/2433/217469
Publikováno v:
SPIE Proceedings.
In principal, the critical dimension (CD) of Nanoimprint lithography (NIL) pattern is determined by the CD of the template pattern. Unless one template is changed to another, NIL does not have a knob for direct control of the CD, such as the exposure
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fdc216a132b9a1b75e8465dfa76633e8
https://doi.org/10.1117/12.2218994
https://doi.org/10.1117/12.2218994
Publikováno v:
Horticultural Research (Japan). 10:15-19
ミズワラビ腋芽を3％ショ糖と10−5 M BAを含むMS培地で培養して誘導されたカルスは，2004年以来現在まで継代培養することができた．また，カルスをBA無添加培地に移すと，植物体が再生
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b2def2f30df6cd3d3d049e5bc180e263
https://doi.org/10.2503/hrj.10.15
https://doi.org/10.2503/hrj.10.15
Publikováno v:
Journal of Applied Physics. 124:143301
Plasma-induced surface roughening and ripple formation has been studied based on Monte Carlo simulations of plasma-surface interactions and feature profile evolution during Si etching in Cl-based plasmas, with emphasis being placed on the role and ef
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c682dae5e26b811eb429dda7b89dbfbe
https://doi.org/10.1063/1.5041846
https://doi.org/10.1063/1.5041846