Zobrazeno 1 - 10
of 157
pro vyhledávání: '"Hirotaka, Toyoda"'
Autor:
Hirotaka Toyoda, Haruka Suzuki
Publikováno v:
Journal of The Surface Finishing Society of Japan. 71:624-628
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::31725f4175081d2f74c36835fb503ced
https://doi.org/10.4139/sfj.71.624
https://doi.org/10.4139/sfj.71.624
Publikováno v:
Japanese Journal of Applied Physics. 62:SI1003
The time dependence of the ion composition in pulse-modulated dual-frequency capacitively coupled plasma with Ar/C4F8/O2 was measured using a quadrupole mass spectrometer with an electrostatic energy analyzer. After turning on the pulse, Ar+ ions wer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::64d3c34552968649517fda51b7b1c45f
https://doi.org/10.35848/1347-4065/acb6a1
https://doi.org/10.35848/1347-4065/acb6a1
Autor:
Trung Nguyen TRAN, Min HU, Tomohiro OGASAWARA, Yuki IWATA, Haruka SUZUKI, Jin SAKAMOTO, Masafumi AKIYOSHI, Hirotaka TOYODA, Hiroto MATSUURA
Publikováno v:
Plasma Science and Technology. 25:035404
This study proposes polyvinyl alcohol–potassium iodide (PVA–KI) as a novel gel chemical probe. The probe uses the reactions among PVA, KI, water, borax, and oxidative species to visualize the distribution of reactive species. This method provides
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d6ca4771894bc15f6363ed427c11f89
https://doi.org/10.1088/2058-6272/ac9891
https://doi.org/10.1088/2058-6272/ac9891
Publikováno v:
Japanese Journal of Applied Physics. 62:SA1008
Currently, the components of semiconductor processing chamber are coated with oxides to avoid metal contamination. As a result, electrical ground is hidden from the plasma. In this study, we experimentally investigate the effect of small ground surfa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5bad7ccbe877797831d1bff96eb009e6
https://doi.org/10.35848/1347-4065/ac7e19
https://doi.org/10.35848/1347-4065/ac7e19
Autor:
Kota Tamura, Junichi Miyazawa, Suguru Masuzaki, Masayuki Tokitani, Yukinori Hamaji, Hirotaka Toyoda
Publikováno v:
Japanese Journal of Applied Physics. 61:106005
A laboratory-scale inductively coupled plasma apparatus investigated the behavior of liquid Sn–Bi–Li–Er alloy (SBLE) under hydrogen (H2) plasma exposure. By exposing the liquid SBLE to H2 plasma, the bubbling of liquid SBLE and pulsive H2 press
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30debee6c2ea77e28ed4185f92b172e7
https://doi.org/10.35848/1347-4065/ac92b1
https://doi.org/10.35848/1347-4065/ac92b1
Autor:
Hirotaka Toyoda
Publikováno v:
RF Power Semiconductor Generator Application in Heating and Energy Utilization ISBN: 9789811535475
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::385f5f09bb06c0b16f9205cc2c21a198
https://doi.org/10.1007/978-981-15-3548-2_8
https://doi.org/10.1007/978-981-15-3548-2_8
Autor:
Hirotaka Toyoda
Publikováno v:
Vacuum and Surface Science. 61:113-118
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b58af93cf251e1e7cbbb780e99f3820d
https://doi.org/10.1380/vss.61.113
https://doi.org/10.1380/vss.61.113
Publikováno v:
Japanese Journal of Applied Physics. 60:126002
A method for enhancing ion flux to the substrate via high-voltage pulse biasing is investigated in an electron cyclotron resonance plasma. When high-voltage pulse biases above 500 V are applied to the stage, an increase in the stage current is observ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::901d2fda706f278d1f176b4a1497331c
https://doi.org/10.35848/1347-4065/ac32b6
https://doi.org/10.35848/1347-4065/ac32b6
Autor:
Haruka Suzuki, Manh Hung Chu, Kazuaki Kurihara, Daiki Iino, Makoto Moriyama, Hirotaka Toyoda, Naoya Nakahara, Keita Ichikawa, Hiroyuki Fukumizu
Publikováno v:
Applied Physics Express. 14:126001
Angular distributions of high energy neutrals and ions, impinging on a RF-biased electrode in a 13.56 MHz capacitively-coupled argon plasma were investigated. Ions and neutrals were introduced into a drift chamber that was directly connected to the R
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e0f66d2a199260aa8f36f31fb7dafd4
https://doi.org/10.35848/1882-0786/ac33c4
https://doi.org/10.35848/1882-0786/ac33c4
Publikováno v:
Vacuum. 192:110429
A method for graphite-like carbon (GLC) deposition using Ar/C6H6 surface-wave plasma (SWP) is proposed. Characteristic of the SWP, i.e., high plasma density with wide spatial uniformity realized uniform carbon film deposition at high deposition rates
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5bd541112a3bd4aae1183c8edd5adfed
https://nagoya.repo.nii.ac.jp/records/2002045
https://nagoya.repo.nii.ac.jp/records/2002045