Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Hiroshi Motoki"'
Publikováno v:
Journal of Electron Microscopy. 47:471-476
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7fcbe39ec93da010f425c1f05231e1df
https://doi.org/10.1093/oxfordjournals.jmicro.a023618
https://doi.org/10.1093/oxfordjournals.jmicro.a023618
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
The measurement precision required for 65 nm technology node is 0.4 nm. However, ITRS has reported that the present CD-SEM has not had sufficient capability for 65 nm technology node. It is necessary to analyze the error factor of measurement precisi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2cb68a2070b729eaf1658763bb203dbb
https://doi.org/10.1117/12.534910
https://doi.org/10.1117/12.534910
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22:226
ArF resist-pattern shrinkage in critical-dimension scanning electron microscopy (CD-SEM) measurement is investigated, and its mechanism is discussed. In CD-SEM irradiation damage in the resist detected by Fourier transform infrared (FTIR) spectroscop
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a085cbcacd7e40613a14bffee03116de
https://doi.org/10.1116/1.1643055
https://doi.org/10.1116/1.1643055