Zobrazeno 1 - 10
of 22
pro vyhledávání: '"Hiroshi Komano"'
Publikováno v:
Journal of Photopolymer Science and Technology. 17:361-366
Carbon contamination which is due to the hydrocarbons reduces the reflectivity of Mo/Si multilayer-mirror and affects the resolution of the mask in EUVL vacuum exposure. For the high-annealing-type chemically amplified (CA) resist based on the polyhy
Publikováno v:
Journal of Photopolymer Science and Technology. 16:467-474
We found that the line edge roughness (LER) of resist pattern could be improved by improving the uniformity of the polymer itself, the main component of the photoresist, at stage of the polymerization. Also, we found that, by using the atomic force m
Publikováno v:
Journal of Photopolymer Science and Technology. 16:455-458
In order to solve pattern collapse problems caused by high aspect ratio, new acetal-based chemically-amplified positive tone resists for electron beam lithography were investigated. Electron beam lithography is in the initial stages of utilization fo
Autor:
Takeo Watanabe, Hiroo Kinoshita, Kazuhiro Hamamoto, Morio Hosoya, Tsutomu Shoki, Hideo Hada, Hiroshi Komano, Shinji Okazaki
Publikováno v:
Japanese Journal of Applied Physics. 41:4105-4110
Summary form only given. In 2006, 256 Gbit DRAM with a gate length of 70 nm will be demanded in the IT industry. Extreme ultraviolet lithography (EUVL) is a promising technology for fabricating fine patterns of less than 70 nm. For practical use, it
Publikováno v:
Journal of Photopolymer Science and Technology. 15:667-671
Recently, fluoropolymers have become promising base resins for single-layer resist uses in 157nm lithography. The 157nm positive-tone resists we studied displayed good optical transparency at 157nm (absorption coefficient of 1.9 to 2.7μm-1). In addi
Publikováno v:
Journal of Photopolymer Science and Technology. 15:417-422
Recently, new resist criteria for low energy electron beam projection lithography (LEEPL) such as bi-layer, chemically amplified and silicon containing resists have been requested. In order to investigate the lithographic characteristics of each syst
Autor:
Kazuhiro Hamamoto, Masayuki Endo, Hiroo Kinoshita, Masaru Sasago, Harushige Tsubakino, Hiroshi Komano, Takeo Watanabe, Hideo Hada
Publikováno v:
Journal of Photopolymer Science and Technology. 14:555-560
Extreme ultraviolet (EUV) lithography requires the vacuum environment for the exposure. The hydrocarbons outgassing ions species affects the reflectivity of the mask and the imaging mirror under EUV irradiation. The photo-induced outgassing was inves
Publikováno v:
Journal of Photopolymer Science and Technology. 13:391-394
Autor:
Hiroshi Komano
Publikováno v:
Journal of the Surface Finishing Society of Japan. 46:778-783
Autor:
Hiroshi Komano
Publikováno v:
Journal of the Surface Finishing Society of Japan. 44:490-494