Zobrazeno 1 - 10
of 254
pro vyhledávání: '"Hiroshi Kawata"'
Autor:
Mao Shibata, Masako Hosoi, Kozo Anno, Naoki Hirabayashi, Yoichiro Hirakawa, Hiroshi Kawata, Rie Iwaki, Ryoko Sawamoto, Nobuyuki Sudo, Toshiharu Ninomiya
Publikováno v:
BMC Endocrine Disorders, Vol 23, Iss 1, Pp 1-9 (2023)
Abstract Objective To investigate associations between parenting styles during childhood and diabetes in adulthood in a Japanese community. Methods In 2011, 710 community-dwelling Japanese residents aged ≥ 40 years were assessed for the presence of
Externí odkaz:
https://doaj.org/article/bb3432879c1b45e3919df3cb0eae38c1
Autor:
Mao Shibata, Masako Hosoi, Kozo Anno, Naoki Hirabayashi, Yoichiro Hirakawa, Hiroshi Kawata, Rie Iwaki, Ryoko Sawamoto, Nobuyuki Sudo, Toshiharu Ninomiya
Publikováno v:
BMC Endocrine Disorders, Vol 23, Iss 1, Pp 1-2 (2023)
Externí odkaz:
https://doaj.org/article/2d6a7e4617a74a5db16d0bbfaa5bd7f2
Autor:
Mitsunao Tomioka, Masako Hosoi, Tomona Okuzawa, Kozo Anno, Rie Iwaki, Hiroshi Kawata, Chiharu Kubo, Nobuyuki Sudo
Publikováno v:
BioPsychoSocial Medicine, Vol 15, Iss 1, Pp 1-10 (2021)
Abstract Background Pictorial Representation of Illness and Self Measure (PRISM) is a tool that can be used to visualize and evaluate the burden of suffering caused by an illness. The aim of this study was to identify which aspects of the burden of c
Externí odkaz:
https://doaj.org/article/c0ea976532a246e4aa9e3beebf1168a2
Autor:
Mitsunao Tomioka, Masako Hosoi, Tomona Okuzawa, Kozo Anno, Rie Iwaki, Hiroshi Kawata, Chiharu Kubo, Nobuyuki Sudo
Publikováno v:
BioPsychoSocial Medicine, Vol 16, Iss 1, Pp 1-2 (2022)
Externí odkaz:
https://doaj.org/article/e8fdcf2eafd34fdfbdfd6992574e68a0
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 21
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fa7b5a9115fe4baac9fc7ca2953494b4
https://doi.org/10.1117/1.jmm.21.2.021210
https://doi.org/10.1117/1.jmm.21.2.021210
Autor:
Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Takashi Obina, Hiroshi Kawata
Publikováno v:
Optical and EUV Nanolithography XXXV.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ee594e6e4f7db1a317b221e731a4b318
https://doi.org/10.1117/12.2613617
https://doi.org/10.1117/12.2613617
Autor:
Norio Nakamura, Ryukou Kato, Hiroshi Sakai, Kimichika Tsuchiya, Yasunori Tanimoto, Yosuke Honda, Tsukasa Miyajima, Miho Shimada, Takanori Tanikawa, Olga A. Tanaka, Takashi Obina, Hiroshi Kawata
Publikováno v:
Japanese Journal of Applied Physics. 62:SG0809
The development of a high-power EUV light source is very important in EUV lithography to overcome the stochastic effects for higher throughput and higher numerical aperture (NA) in the future. We have designed and studied a high-power EUV free-electr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c43762048bee1e4f2cb5a608873f585
https://doi.org/10.35848/1347-4065/acc18c
https://doi.org/10.35848/1347-4065/acc18c
Autor:
Chiharu Kubo, Rie Iwaki, Nobuyuki Sudo, Mitsunao Tomioka, Kozo Anno, Masako Hosoi, Tomona Okuzawa, Hiroshi Kawata
Publikováno v:
BioPsychoSocial Medicine
BioPsychoSocial Medicine, Vol 15, Iss 1, Pp 1-10 (2021)
BioPsychoSocial Medicine, Vol 15, Iss 1, Pp 1-10 (2021)
Background Pictorial Representation of Illness and Self Measure (PRISM) is a tool that can be used to visualize and evaluate the burden of suffering caused by an illness. The aim of this study was to identify which aspects of the burden of chronic pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a935974c41f48c9037999e2a8681b685
http://europepmc.org/articles/PMC8606086
http://europepmc.org/articles/PMC8606086
Autor:
Kimichika Tsuchiya, Takashi Obina, Hiroshi Kawata, Hiroshi Sakai, Yasunori Tanimoto, Norio Nakamura, Ryokou Kato, Miho Shimada, Tsukasa Miyajima, Yosuke Honda
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
An ERL(energy recovery linac)-based EUV-FEL can provide EUV power of more than 1 kW for multiple scanners to overcome stochastic noise and to achieve higher throughput. An IR-FEL project started at the KEK cERL for the purpose of developing high-powe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::aeb73bc543d7a71f22f6d3f5d8f83db5
https://doi.org/10.1117/12.2600782
https://doi.org/10.1117/12.2600782
Autor:
Tsukasa Miyajima, Yasunori Tanimoto, Norio Nakamura, Ryukou Kato, Kimichika Tsuchiya, Yosuke Honda, Hiroshi Sakai, Hiroshi Kawata, Miho Shimada
Publikováno v:
Extreme Ultraviolet Lithography 2020.
An EUV-FEL is one of the promising candidates for the future high power EUV light source of more than 1 kW. While the design study on the FEL light source has been progressed, a most important milestone should be a real demonstration of the high repe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96a15e26553231c13298cfac6c0b4166
https://doi.org/10.1117/12.2573121
https://doi.org/10.1117/12.2573121