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pro vyhledávání: '"Hiroshi Arishima"'
Autor:
Kawahara Takayuki, Noriaki Shimodaira, Hiroshi Arishima, Shuhei Yoshizawa, Hitoshi Mishiro, Yoshiaki Ikuta, Shinya Kikugawa
Publikováno v:
SPIE Proceedings.
Projection photolithography at 157 nm is now under research as a possible extension of current 248 nm and planned 193 nm technologies. However, the conventional silica glass used for 248 nm and 193 nm lithography cannot be applied for 157 nm lithogra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0503d0819abb60b125b3ee9d2e685e53
https://doi.org/10.1117/12.373303
https://doi.org/10.1117/12.373303
