Výsledky vyhledávání - "Hiroo, Kinoshita"

Pulse width dependence of laser-induced damage thresholds on silica glasses by soft X-ray lasers

Autor: Thanh Hung Dinh, Shigeki Owada, Masahiko Ishino, Katsuhiro Mikami, Shinji Motokoshi, Noboru Hasegawa, Akira Kon, Masaharu Nishikino, Yuichi Inubushi, Hiroo Kinoshita

Publikováno v: Laser-induced Damage in Optical Materials 2020.

We evaluated laser-induced damage thresholds (LIDTs) on silica glasses by two kinds of ultra-short soft X-ray laser pulses (13.5 nm, 70 fs, and 13.9 nm, 7 ps). The comparison of our experimental results and the reported values observed by nanosecond

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::1cefadd5c327b8c768c0d4df232160a0
https://doi.org/10.1117/12.2570991

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Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation

Autor: Koki Ueno, Kazumasa Okamoto, Yuichi Inubushi, Takahiro Kozawa, Shunpei Kawai, Akira Kon, Hiroo Kinoshita, Shigeki Owada, Yuta Ikari, Thanh-Hung Dinh, Yohei Arai, Masahiko Ishino, Akihiro Konda, Masaharu Nishikino, Shigeo Hori

Publikováno v: Applied Physics Express. 14:066502

Efforts are being focused on increasing the power of extreme ultraviolet (EUV) light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a c

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e9effc818f8e5b6eaa00f2d4935e71be
https://doi.org/10.35848/1882-0786/abfca3

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Dependence of dose rate on the sensitivity of the resist under ultra-high flux extreme ultraviolet (EUV) pulse irradiation

Autor: Kazumasa, Okamoto, Shunpei, Kawai, Yuta, Ikari, Shigeo, Hori, Akihiro, Konda, Koki, Ueno, Yohei, Arai, Masahiko, Ishino, Dinh, Thanhhung, Masaharu, Nishikino, Akira, Kon, Shigeki, Owada, Yuichi, Inubushi, Hiroo, Kinoshita, Takahiro, Kozawa

Publikováno v: Applied Physics Express. 14:066502

Efforts are being focused on increasing the power of EUV light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a critical issue. A chemi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=jairo_______::4409df2361d3c0c2c3dfec59ddde7569
https://repo.qst.go.jp/records/82819

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Laser-induced damage thresholds and mechanism of silica glass induced by ultra-short soft x-ray laser pulse irradiation

Autor: Katsuhiro Mikami, Noboru Hasegawa, Hiroo Kinoshita, Masahiko Ishino, Shigeki Owada, Akira Kon, Masaharu Nishikino, Yuichi Inubushi, Shinji Motokoshi, Thanh-Hung Dinh

Publikováno v: Optics Letters. 45:2435

Laser-induced damage thresholds (LIDTs) of silica glasses obtained by the femtosecond soft x-ray free-electron laser (SXFEL, 13.5 nm, 70 fs) and the picosecond soft x-ray laser (SXRL, 13.9 nm, 7 ps) are evaluated. The volume of the hydroxyl group in

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6ea72a1ea11ed4b6a615b95c7468e382
https://doi.org/10.1364/ol.389288

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Actinic Mask Inspection System Using HHG EUV Source

Autor: Hiroo Kinoshita

Publikováno v: High-Brightness Sources and Light-driven Interactions.

A coherent scatterometry microscope (CSM) has been developed, in which high-order harmonic generation (HHG) is employed to produce coherent 13.5 nm light. The HHG-CSM is used to inspect absorber pattern defects and phase defects.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::48d46699377190029ae70b7e0a40d756
https://doi.org/10.1364/euvxray.2018.ew1b.3

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Development of element technologies for EUVL

Autor: Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita

Publikováno v: Advanced Optical Technologies. 4:319-331

Thirty years have passed since the first report on extreme ultraviolet lithography (EUVL) was presented at the annual meeting of the Japanese Society of Applied Physics in 1986. This technology is now in the manufacturing development stage. The high-

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::0cdf6f8903c01083e63059baaec4100e
https://doi.org/10.1515/aot-2015-0027

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