Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Hironobu Yabuta"'
Autor:
Klaus Bergmann, B Santos, Alexander von Wezyk, Takahiro Shirai, Daiki Yamatani, Yusuke Teramoto, Noritaka Ashizawa, Kunihiko Kasama, Akihisa Nagano, Yuta Taniguchi, Margarete Kops, Ralf Kops, Hironobu Yabuta, Guido Mertens
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII.
High-throughput actinic mask inspection tools are needed as EUVL begins to enter into volume production phase. One of the key technologies to realize such inspection tools is a high-radiance EUV source of which radiance is supposed to be as high as 1
Autor:
Alexander von Wezyk, Guido Mertens, Klaus Bergmann, Takahiro Shirai, Kiyotada Nakamura, Hironobu Yabuta, Akihisa Nagano, Yusuke Teramoto, Ralf Kops, Kazuya Aoki, Kunihiko Kasama, Margarete Kops, Noritaka Ashizawa, Yuta Taniguchi, B Santos
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
High-throughput and -resolution actinic mask inspection tools are needed as EUVL begins to enter into volume production phase. To realize such inspection tools, a high-radiance EUV source is necessary. Ushio’s laser-assisted discharge-produced plas
Autor:
Margarete Kops, Guido Mertens, Yuta Taniguchi, Alexander von Wezyk, Takahiro Shirai, Noritaka Ashizawa, Klaus Bergmann, Yusuke Teramoto, Kunihiko Kasama, Ralf Kops, Hironobu Yabuta, B Santos, Akihisa Nagano
Publikováno v:
High-Brightness Sources and Light-Driven Interactions.
A compact high-brightness EUV source is needed for high-throughput actinic mask inspection in EUV lithography. Ushio is developing a light source utilizing LDP technology where rotating Sn-covered electrodes, trigger lasers and pulsed electrical disc
Autor:
Yusuke Teramoto, Bárbara Santos, Guido Mertens, Ralf Kops, Margarete Kops, Alexander von Wezyk, Hironobu Yabuta, Akihisa Nagano, Takahiro Shirai, Noritaka Ashizawa, Kiyotada Nakamura, Kunihiko Kasama
Publikováno v:
SPIE Proceedings.
Publikováno v:
ResearcherID
Scopus-Elsevier
Scopus-Elsevier
大気圧ヘリウム誘導結合プラズマは, その高いイオン化能力によりハロゲン元素及び非金属元素に対しても有効であるために, 分析用の光源やイオン源として注目されている. しかし, プ
Publikováno v:
J.Anal.At.Spectrom.. 17:1090-1095
In this study, we concentrated on improving the vortex flow uniformity, which was considered as a key factor for our new ICP torch design. To obtain a uniform vortex flow with lower plasma gas consumption, our new ICP torch had a dual gas inlet, and
Autor:
Margarete Kops, Kiyotada Nakamura, Gota Niimi, B Santos, Ralf Kops, Yusuke Teramoto, Takuma Yokoyama, Takahiro Shirai, Noritaka Ashizawa, Guido Mertens, Hiroto Sato, Hironobu Yabuta, Kunihiko Kasama, Felix Küpper, Akihisa Nagano, Masaki Yoshioka
Publikováno v:
SPIE Proceedings.
Actinic mask inspection manufactures are currently searching for high-radiance EUV sources for their tools. LDP source, which was previously used for lithography purposes, was found to be a good candidate as it can provide sufficient power and radian
Publikováno v:
Scopus-Elsevier
He ICPMSを製作するための第一段階として,He ICP用のインターフェースを新しく設計·試作し,ラングミュアプローブを用いてインターフェース内プラズマの空間電位,浮遊電位,電子温度,電子
Publikováno v:
SPIE Proceedings.
Debris-mitigation tools (DMTs) have been used in DPP sources and the performance has been well proven in alpha sources. In beta and HVM sources, requirement to the DMT is increasing to fulfill the power and lifetime requirements simultaneously. In or
Autor:
Tomonao Hosokai, Hiroto Sato, Takahiro Shirai, Shinsuke Mouri, Daiki Yamatani, Kiyoyuki Kabuki, Kazuaki Hotta, Yuki Joshima, Takahiro Inoue, Koji Miyauchi, Takuma Yokoyama, Yusuke Teramoto, Toshio Yokota, Gohta Niimi, Hiroshi Mizokoshi, Tetsu Takemura, Kohkan C. Paul, Hironobu Yabuta, Kazunori Bessho, Zenzo Narihiro
Publikováno v:
SPIE Proceedings.
Discharge-produced plasma (DPP)-based EUV source is being developed at Gotenba Branch of EUVA Hiratsuka RDsr within 2 % bandwidth around 13.5 nm. Using a nested grazing-incidence collector, EUV power at the intermediate focus which is defined as an i