Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Hirokuni Saito"'
Autor:
Masaru Takeshita, Hirokuni Saito, Jiro Yokoya, Ryoichi Takasu, Tasuku Matsumiya, Katsumi Ohmori, Tsuyoshi Nakamura, Yasuhiro Yoshii
Publikováno v:
Journal of Photopolymer Science and Technology. 23:205-209
Pattern collapse becomes one of the serious issues for critical patterning process below 45nm half pitch. Many reports have been published in recent days to investigate pattern collapse mechanism. There are factors such as capillary force, hardness,
Autor:
Masaru Takeshita, Yasuhiro Yoshii, Hirokuni Saito, Jiro Yokoya, Ryoichi Takasu, Katsumi Ohmori, Tsuyoshi Nakamura
Publikováno v:
SPIE Proceedings.
Double patterning with 193nm immersion lithography becomes to most promising candidate for 32nm half pitch node and possibly below 32nm half pitch. Several double patterning methods have been suggested such as LELE (Litho-Etch -Litho-Etch), LLE (Lith