Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Hiroki Shirahama"'
Autor:
Hideaki Terakado, Makoto Karyu, Miyamoto Takashi, Hiroki Shirahama, Hirotsugu Ita, Yoshinori Iino, Makoto Muto, Mumenori Iwami, Tomoaki Yoshimori, Yoshie Okamoto, Shunpei Kodama, Kei Hattori, Kazuki Nakazawa, Hidehito Azumano
Publikováno v:
Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology.
We have investigated Cr film etching mechanism systematically in order to minimize CDU (CD Uniformity). As a result, employing our dry etching system ARESTM with optimized etch process we achieved an excellent CDU(3σ) (0.5nm with etch contribution).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e94319eafd036a3730096eb217900bbb
https://doi.org/10.1117/12.2502053
https://doi.org/10.1117/12.2502053
Autor:
Kei Hattori, Takashi Miyamoto, Yoshinori Iino, Shunpei Kodama, Yoshie Okamoto, Kazuki Nakazawa, Makoto Karyu, Hideaki Terakado, Hiroki Shirahama, Hirotsugu Ita, Tomoaki Yoshimori, Hidehito Azumano, Makoto Muto, Mumenori Iwami
Publikováno v:
Proceedings of SPIE; 8/23/2018, Vol. 10807, p1-6, 6p
Autor:
Hiroki Shirahama, Makoto Muto, Yoshihisa Kase, Munenori Iwami, Yoshie Okamoto, Hirotsugu Ita, Kazuki Nakazawa, Ivan Ganachev, Hidehito Azumano, Tomoaki Yoshimori
Publikováno v:
SPIE Proceedings.
We review the state-of-art and issues of dry etching of masks for nano-device photo lithography. After introducing the basics of photo-mask structures and their plasma etching, we discuss the specifics of mask etching as compared to the etching of si
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::007e94762451f622a6a623d434d0f4a3
https://doi.org/10.1117/12.2073069
https://doi.org/10.1117/12.2073069