Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Hirokazu Nishimaki"'
Autor:
Saito Daigo, Karasawa Ryo, Hashimoto Keisuke, Hirokazu Nishimaki, Tokunaga Hikaru, Endo Takafumi, Rikimaru Sakamoto
Publikováno v:
Journal of Photopolymer Science and Technology. 30:373-378
In advanced lithography technology, high planarity SOC (Spin-on-Carbon) materials which can planarize topography substrates are required in order to obtain enough process margin. We developed photo curing SOC (P-SOC) materials which can be cross-link
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::61ec7055adf8843a77bf4c7d3e9da1ef
https://doi.org/10.2494/photopolymer.30.373
https://doi.org/10.2494/photopolymer.30.373
Autor:
and Takashi Nogami, Shinichiro Mashiyama, Masanori Yasui, Takayuki Ishida, Hirokazu Nishimaki
Publikováno v:
Chemistry of Materials. 18:3602-3604
The practically diamagnetic phase of the title biradical underwent a solid-state phase transition at 350 K with a drastic χmolT jump by an almost ideal value of 1 cm3 K mol-1 to give a stable S = 1 paramagnetic state.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2e53b99839fe1818328f861d19f6df0d
https://doi.org/10.1021/cm061222k
https://doi.org/10.1021/cm061222k
Autor:
Takashi Matsumoto, Rikimaru Sakamoto, Yasunobu Someya, Tetsuya Shinjo, Karasawa Ryo, Hashimoto Keisuke, Hirokazu Nishimaki
Publikováno v:
SPIE Proceedings.
For the mass production of the advanced semiconductor device, the multi-layer process has been used for the essential technique {photoresist/ silicon contained hard mask (Si-HM)/ spin-on-carbon-hardmask (SOC)}. Spin -on-Carbon material plays a very i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ebc26269d9ae8e8e7e701eacb1d3478f
https://doi.org/10.1117/12.916128
https://doi.org/10.1117/12.916128
Autor:
Takayuki Ishida, Hirokazu Nishimaki
Publikováno v:
Journal of the American Chemical Society. 132(28)
The title compound showed a unique low-dimensional array with S = 1 molecules. The intermolecular antiferromagnetic coupling and intramolecular ferromagnetic coupling are simultaneously present, and accordingly, the S = 1/2 state appeared at 230−35
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::8be6676b23a139d69cdf212285d31302
https://pubmed.ncbi.nlm.nih.gov/20586424
https://pubmed.ncbi.nlm.nih.gov/20586424