Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Hiroie Matsumoto"'
Autor:
Kevin Cummings, Vinayak Rastogi, Hiroie Matsumoto, Cecilia Montgomery, David Hetzer, Andrew Metz, Takashi Saito, Lior Huli, Warren Montgomery, Jun Sung Chun, Shih-Hui Jen, Yu-Jen Fan, Mark Neisser
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Recently there has been a great deal of effort focused on increasing EUV scanner source power; which is correlated to increased wafer throughput of production systems. Another way of increasing throughput would be to increase the photospeed of the ph
Autor:
David DeKraker, Michael Kocsis, Hiroie Matsumoto, Lior Huli, Benjamin L. Clark, Shan Hu, Michael Greer, Koichi Matsunaga, Masashi Enomoto, Richard A. Farrell, Jeffrey M. Lauerhaas, Andrew Grenville, Andrew Metz, Shinchiro Kawakami, Takashi Saito, David Hetzer, Anthony S. Ratkovich
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Inpria is pioneering a novel approach to EUV photoresist. Directly patternable metal oxide thin films have shown resolution better than 10nm half-pitch, with robust etch resistance, and efficient use of photons through high EUV absorbance. Inpria’s
Autor:
Yannick Feurprier, Katie Lutker-Lee, Vinayak Rastogi, Hiroie Matsumoto, Yuki Chiba, Andrew Metz, Kaushik Kumar, Genevieve Beique, Andre Labonte, Cathy Labelle, Yann Mignot, Bassem Hamieh, John Arnold
Publikováno v:
SPIE Proceedings.
A method for treating a substrate is disclosed. The method includes forming a film stack on the substrate, the film stack comprising an underlying layer, a coating layer disposed above the underlying layer, and a patterning layer disposed above the c