Reduction and Surface Treatment for Oxidized Copper Electrodes by Water Vapor Plasma

Autor: Taichi Hashimoto, Hirohiko Nakano, Hirokazu Terai, Osamu Tsuji

Publikováno v: 2019 IEEE CPMT Symposium Japan (ICSJ).

In this paper, water vapor plasma is introduced as a safe reduction method for oxidized copper electrodes. Hydrophilization and etching of photoresist are also investigated for use in pillar and microbump formation process.

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::a49b8a350c8132112ea8969ace7a01bd
https://doi.org/10.1109/icsj47124.2019.8998641

Simple Monitoring of Discharge State in Inductively Coupled Plasma Using Radio Frequency Impedance Analyzer

Autor: Shinji Nakagami, Hirohiko Nakano, Kikuko Yoshimura, Takeshi Minaguchi, Osamu Tsuji, Toshiaki Tatsuta

Publikováno v: Journal of Photopolymer Science and Technology. 15:283-290

Changes of discharge state in inductively coupled plasma (ICP) were investigated by use of a radio frequency (RF) impedance analyzer. A voltage loaded on the ICP coil and a current flowing within the coil were plotted against the RF power, and the tw

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b06e80fe781c2345b13ef837b1fd53ce
https://doi.org/10.2494/photopolymer.15.283

Addition Effect of Argon and Water Vapor on Plasma Copolymerization of Trifluoromethanesulfonic Acid with Octafluorocyclobutane

Autor: Osamu Tsuji, Hirohiko Nakano, Kikuko Yoshimura, Toshiaki Tatsuta, Takeshi Minaguchi

Publikováno v: Journal of Photopolymer Science and Technology. 14:73-80

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::88a175e541c64279d260c031d544e9d7
https://doi.org/10.2494/photopolymer.14.73

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Autor: Satoshi KUROKOUCHI, Masayuki OKABE, Mitsuyoshi SAITO, Shinsaku MORITA, Yoshiro SHIOKAWA, Masakazu ICHIKAWA, Seiichiro KANNO, Tatehito USUI, Koichi SUDOH, Tatsuo YOSHINOBU, Hiroshi IWASAKI, Hiroaki TANAKA, Kimio OKUNO, Tadao MIURA, Touru SUMIYA, Katsuya HONDA, Shun-ichiro TANAKA, Yukio INOKUTI, Kazuhiro SUZUKI, Nastuki TAKAHASHI, Osamu OHKUBO, Yoshihiro SAWAHIRA, Akishige SATO, Naoto KIKUCHI, Eiji KUSANO, Hidehito NANTO, Akira KINBARA, Tetsuya NARUSHIMA, Akiko ITAKURA, Takaya KAWABE, Masahiro KITAJIMA, Masaru KITAGAWA, Toshiyuki OHYA, Hiroyuki NAGAHAMA, Sei-ichiroh YOKOYAMA, Ichiro ARAKAWA, Takashi ADACHI, Takato HIRAYAMA, Koichiro MITSUKE, Makoto SAKURAI, Sin-ichi IGARASHI, Yukiko ABE, Yasuo IRIE, Miyuki KAMBE, Aki TOSAKA, Satoko HAMAMATSU, Satoshi ISHII, Yoshiyuki NORIMITSU, Toshimi SUTOU, Noriyuki UBUKATA, Yoshihiro OINUMA, Shigeru SAITO, Masaaki KATOH, Kenichi TAJIMA, Daisuke HORIMOTO, Takeo OHTE, Akira KOJIMA, Seiya OHI, Takashi SHIOYA, Kazuhiko KOBAYASHI, Hidefumi NAKAJIMA, Satoshi YOKOYAMA, Hiroyuki OBARA, Hajime SAKAI, Yasuhiro OGOSHI, Takuro KOIKE, Koichiro UCHIMURA, Hitoshi TABATA, Tomoji KAWAI, Yutaka HIBINO, Guochun XU, Yasuo SUZUKI, Masao TANIHARA, Yukio IMANISHI, Shigemi SUGINUMA, Masahiro HIRATA, Hitoshi AKIMICHI, Kyoko TAKEUCHI, Yutaka TUZI, Masahiro TOSA, Akira KASAHARA, Kyung Sub LEE, Kazuhiro YOSHIHARA, Tomonari TANAKA, Tadashi SAWADA, Wataru SUGIYAMA, Koyu OTA, Daisuke YAMAUCHI, Shinobu SATO, Masatoshi TANAKA, Masaaki KISHIDA, Masahiko TOMITORI, Kiyotaka ASAKURA, Wang-Jae CHUN, Yasuhiro IWASAWA, Kiminori KAKITANI, Hiroko KAJI, Yoichiro YAGI, Akio YOSHIMORI, Akio OKAMOTO, Toshikazu NOSAKA, Masaaki YOSHITAKE, Souichi OGAWA, Shigeaki NAKAMURA, Nobuo SAITO, Shoji YOSHIOKA, Isamu NAKAAKI, Hideo HASEGAWA, Toshiyuki MIHARA, Shoichi MOCHIZUKI, Shigeharu TAMURA, Hironori KOBAYASHI, Ryoji MAKABE, Tadashi ISHIDA, Yoshiyuki SATO, Masanori ANDO, Tetsuhiko KOBAYASHI, Ayako HIOKI, Kazuki NATSUKAWA, Koji INOUE, Yoshikazu NAKAYAMA, Takayuki SATO, Shinichiro MICHIZONO, Yoshio SAITO, Shinichi KOBAYASHI, Kiyohide KOKUBUN, Yuuki WATANABE, Heizo TOKUTAKA, Kikuo FUJIMURA, Tatsuo SHIMIZU, Yasushiro NISHIOKA, Hideki TANAKA, Hiroyuki WAKIMOTO, Toshihiko MIYAZAKI, Goro MIZUTANI, Sukekatsu USHIODA, Yoshitake YAMAGUCHI, Satoru TAKAKUSAGI, Makoto KATO, Yuji SAKAI, Akira KUROKAWA, Shingo ICHIMURA, Ken NAKAMURA, Takanori AOKI, Syogo TODA, Akio SUZUKI, Tatsuhiko MATSUSHITA, Masahiro OKUDA, Kazuaki HAMAJI, Yoshiharu KAKEHI, Tsutom YOTSUYA, Norihiro MATSUOKA, Yoshitsugu TSUTSUMI, Hideki TOMIOKA, Yoshio OKAMOTO, Kensuke MURAI, Masato YASUMOTO, Norimasa UMESAKI, Hirohiko NAKANO, Toshiaki TATSUTA, Jiro MATSUO, Isao YAMADA, Hiroyuki MAGARA, Osamu TABATA, Touichi HATANO, Masatoshi KOTERA, Kiyoshi YAMAGUCHI, Naohiro HORII, Kunio OKIMURA, Akira SHIBATA, Hiroshi MURAKAMI, Ikuya KAMEYAMA, Satoru SUKENOBU, Kazuhiko MIMOTO, Takashi MATSUMOTO, Takafumi YOSHIKAWA, Masato KIUCHI, Seiichi GOTO, Masatoshi OHBA, Yoshiaki AGAWA, Kazuma SHIBUTANI, Hiroshi TSUJI, Yasuhito GOTOH, Junzo ISHIKAWA, Hiroki KAWADA, Hiroyuki KITSUNAI, Nobuo TSUMAKI, Masanori KATSUYAMA, Shinichi SUZUKI, Katsuto TANAHASHI, Yuichi KAWAMURA, Naohisa INOUE, Yoshikazu HOMMA, Michimasa KIKUCHI, Kazumasa ISHIKAWA, Teiichi HOMMA, Yoshinori SUGANUMA, Nan LI, Katsuyoshi KOBAYASHI, Nobuyoshi SAKAKIBARA, Yoshiki UENO, Masayuki AOKI, Toshiaki YASUI, Keito MORIMOTO, Hirokazu TAHARA, Takao YOSHIKAWA, Hidekazu KODERA, Masahiko UOTA, Yoshihiro SATOH, Tomio KUBO, Kozo MOCHIJI, Naoshi ITABASHI, Hiroshi SHIMIZU, Shunsuke OHTANI, Kazuhiko OKUNO, Nobuo KOBAYASHI

Publikováno v: SHINKU. 42:417-495

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e06a27fd4675b04c3a233a96939266ab
https://doi.org/10.3131/jvsj.42.417

Materials Characterization of Plasma Deposited Copolymers using CFC-113, CFC-12 and PFC-116 with C2H4 Monomers

Autor: Osamu Tsuji, Hirohiko Nakano, Kikuko Yoshimura, Takeshi Minaguchi, Toshiaki Tatsuta

Publikováno v: Journal of Photopolymer Science and Technology. 11:307-312

CFC-113 (Cl2FC/CClF2), CFC-12 (CCl2F2), and PFC-116 (F3C/CF3) were each combined with ethylene (H2C=CH2) in plasma copolymerization to deposit polymer films. The relative deposition rate was shown to be CFC-113>CFC-12>PFC-116, which indicates that th

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6cc93d1d6cfc1063055c0a138c9df7bb
https://doi.org/10.2494/photopolymer.11.307