Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Hiroaki TOMURO"'
Autor:
Hiroaki Tomuro, Yoshifumi Ueno, Shinji Nagai, Fumio Iwamoto, Kenichi Miyao, Hideyuki Hayashi, Takuya Ishii, Tamotsu Abe, Hiroaki Nakarai, Takashi Saitou, Hakaru Mizoguchi
Publikováno v:
Optical and EUV Nanolithography XXXVI.
Autor:
Yoshiyuki Honda, Shinji Nagai, Masayuki Morita, Masahiko Andou, Hiroaki Tomuro, Akifumi Matsuda, Mamoru Yoshimoto
Publikováno v:
SSRN Electronic Journal.
Autor:
Hakaru Mizoguchi, Hiroaki Tomuro, Yuichi Nishimura, Hirokazu Hosoda, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tatsuya Yanagiga, Georg Soumagne, Fumio Iwamoto, Shinji Nagai, Yoshifumi Ueno, Takashi Suganuma, Gouta Niimi, Takayuki Yabu, Tsuyoshi Yamada, Takashi Saitou
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2021.
Autor:
Kouichiro Kouge, Kentaro Tomita, Junya Hotta, Yiming Pan, Hiroaki Tomuro, Tatsuya Yanagida, Kiichiro Uchino, Naoji Yamamoto
Publikováno v:
Japanese Journal of Applied Physics. 61:056001
Temporal evolutions of electron temperature ( T e ) and electron density ( n e ) of photoionized hydrogen plasmas, which were induced by radiation from laser-produced Sn-plasma EUV sources, were measured using the laser Thomson scattering technique.
Autor:
Mamoru Yoshimoto, Yutaka Shiraishi, Masahiko Andou, Yoshiyuki Honda, Akifumi Matsuda, Masayuki Morita, Hiroaki Tomuro, Tatsuya Yanagida
Publikováno v:
Applied Physics Express. 13(Number 11)
Autor:
Tsuyoshi Yamada, Hiroaki Nakarai, Hirokazu Hosoda, Yukio Watanabe, Takashi Saitou, Nishimura Yuichi, Takashi Suganuma, Yutaka Shiraishi, Hakaru Mizoguchi, Yoshifumi Ueno, Georg Soumagne, Tamotsu Abe, Tatsuya Yanagiga, Gouta Niimi, Fumio Iwamoto, Shinji Nagai, Hiroaki Tomuro, Takayuki Yabu, Hiroshi Tanaka
Publikováno v:
Extreme Ultraviolet Lithography 2020.
Gigaphoton develops CO2-Sn-LPP EUV light source which is the most promising solution as the 13.5nm high power light source for HVM EUVL. Unique and original technologies including; combination of pulsed CO2 laser and Sn droplets, dual wavelength lase
Autor:
Hiroaki TOMURO, Mengran JI, Ryo NAGATA, Koichiro KOUGE, Tatsuya YANAGIDA, Masayuki MORITA, Masahiko ANDOU, Yoshiyuki HONDA, Kiichiro UCHINO, Tsuyoshi YOSHITAKE
Publikováno v:
Plasma and Fusion Research. 17:1406005-1406005
Autor:
Kentaro Tomita, Kouichiro Kouge, Naoji Yamamoto, Hiroaki Tomuro, Kiichiro Uchino, Tatsuya Yanagida, Yiming Pan, Masayuki Morita, Junya Hotta
Publikováno v:
Japanese Journal of Applied Physics. 60:066002
We observed the spatial and temporal changes of the electron density (n e) and the electron temperature (T e) of hydrogen plasmas around a laser-produced Sn plasma EUV source. The plasma parameters were measured by the laser Thomson scattering (LTS)
Autor:
Syouichi Tsukiyama, Kouichiro Kouge, Tatsuya Yanagida, Kiichiro Uchino, Hakaru Mizoguchi, Katsunobu Nishihara, Yasunori Wada, Hiroaki Tomuro, Toshiaki Eguchi, Atsushi Sunahara, Takeshi Kodama, Georg Soumagne, Yuta Sato, Masahito Kunishima, Kentaro Tomita
Publikováno v:
Scientific Reports
Scientific Reports, Vol 7, Iss 1, Pp 1-7 (2017)
Scientific Reports, Vol 7, Iss 1, Pp 1-7 (2017)
Time-resolved two-dimensional (2D) profiles of electron density (ne) and electron temperature (Te) of extreme ultraviolet (EUV) lithography light source plasmas were obtained from the ion components of collective Thomson scattering (CTS) spectra. The
Autor:
Tatsuya Yanagida, Toshiaki Eguchi, Hakaru Mizoguchi, Takeshi Kodama, Syoichi Tsukiyama, Hiroaki Tomuro, Yasunori Wada, Kouichiro Kouge, Kiichiro Uchino, Kentaro Tomita, Yuta Sato, Masahito Kunishima
Publikováno v:
Japanese Journal of Applied Physics. 56:036201
Spatial profiles of the electron density (n e), electron temperature (T e), and average ionic charge (Z) of laser-produced Sn plasmas for EUV lithography, whose conversion efficiency (CE) is sufficiently high for practical use, were measured using a