Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Himamshu C. Nallan"'
Publikováno v:
ACS Applied Energy Materials. 4:13297-13306
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::19c9cfa27aa26b737eaf9eb853fb0fdb
https://doi.org/10.1021/acsaem.1c02903
https://doi.org/10.1021/acsaem.1c02903
Publikováno v:
Chemistry of Materials. 32:6035-6042
Low-temperature, plasma-free atomic layer etching (ALE) of Pd0 is explored. A vacuum ultraviolet (VUV) light source (115 < λ < 400 nm) is used in conjunction with a controlled O2 gas exposure to pr...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b422114af19c61406950d64723380c6c
https://doi.org/10.1021/acs.chemmater.0c01379
https://doi.org/10.1021/acs.chemmater.0c01379
Publikováno v:
Journal of Vacuum Science & Technology A. 40:062406
Nickel and nickel oxide are utilized within various device heterostructures for chemical sensing, solar cells, batteries, etc. Recently, the rising interest in realizing low-cost, flexible electronics to enable ubiquitous sensors and solar panels, ne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14d8cc8b2c093f4b1a1b511a3fef6edc
https://doi.org/10.1116/6.0002068
https://doi.org/10.1116/6.0002068
Publikováno v:
ACS applied materialsinterfaces. 12(45)
Density functional theory (DFT) is used to better understand the oxidation of Pd metal using vacuum ultraviolet (VUV) light co-exposed with O2, which is known to produce O and O3. The oxidation of Pd metal arising from O, O2, and O3 is assessed on ba
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b146d368388ec3445e31845b3b96fff3
https://pubmed.ncbi.nlm.nih.gov/33119248
https://pubmed.ncbi.nlm.nih.gov/33119248
Publikováno v:
Journal of Vacuum Science & Technology A. 39:012601
Vacuum ultraviolet (VUV) enhanced atomic layer etching (ALE) of thin (∼8 nm) Ru films is demonstrated. Oxidation half-cycles of 2–5 min VUV/O2 co-exposure are used to oxidize near-surface Ru to RuO2 at 1 Torr O2 and 100–150 °C. In situ x-ray p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::85db91484416faddf81f19e3ab36ed68
https://doi.org/10.1116/6.0000742
https://doi.org/10.1116/6.0000742
Autor:
Zizhuo Zhang, Himamshu C. Nallan, Tanmoy Pramanik, Sanjay K. Banerjee, Brennan M. Coffey, Thong Q. Ngo, John G. Ekerdt
Publikováno v:
Journal of Vacuum Science & Technology A. 37:010903
The authors report the deposition of 4.5-nm-thick cobalt (II) oxide on SiO2/Si(001) and MgO(001) substrates at 180–270 °C by atomic layer deposition using bis(N-tert-butyl-N′-ethylpropionamidinato) cobalt (II) and water as coreactants. The resul
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0f2875bebd660a9945f05131c5983ca3
https://doi.org/10.1116/1.5063669
https://doi.org/10.1116/1.5063669
Autor:
Steven K. Volkman, Rungrot Kitsomboonloha, Vivek Subramanian, Himamshu C. Nallan, Jacob A. Sadie
Publikováno v:
Langmuir : the ACS journal of surfaces and colloids. 30(44)
Drop-on-demand inkjet printing of functional inks has received a great deal of attention for realizing printed electronics, rapidly prototyped structures, and large-area systems. Although this method of printing promises high processing speeds and mi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b4bd4631197aa38129da3b3c2c5d3f39
https://pubmed.ncbi.nlm.nih.gov/25310729
https://pubmed.ncbi.nlm.nih.gov/25310729
Publikováno v:
Advanced Electronic Materials. 1:1500086
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0729d90d827fd977752784a6ce486f64
https://doi.org/10.1002/aelm.201500086
https://doi.org/10.1002/aelm.201500086
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