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Autor:
Takahiro Kitano, Hiroki Yonemitsu, Yuriko Seino, Takayuki Toshima, Katsutoshi Kobayashi, Seiji Nagahara, Hironobu Sato, Makoto Muramatsu, Tsukasa Azuma, Ayako Kawanishi, Hikazu Kato, Masahiro Kanno
Publikováno v:
Alternative Lithographic Technologies IV.
We report on a contact hole shrink process using directed self-assembly. A diblock copolymer, poly (styrene-blockmethyl methacrylate) (PS-b-PMMA), is used to shrink contact holes. Contact hole guide patterns for graphoepitaxy are formed by ArF photor
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8592a1b51ba003c787822f9337291b76
https://doi.org/10.1117/12.915652
https://doi.org/10.1117/12.915652
