Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Higman, T. K."'
Publikováno v:
Journal of Applied Physics; 8/15/1987, Vol. 62 Issue 4, p1495, 5p, 3 Diagrams, 1 Chart, 1 Graph
Publikováno v:
Journal of Applied Physics; 7/15/1986, Vol. 60 Issue 2, p677, 4p
Publikováno v:
Journal of Applied Physics; 1/1/1989, Vol. 65 Issue 1, p378, 3p
Publikováno v:
Journal of Applied Physics; 11/15/1986, Vol. 60 Issue 10, p3775, 3p, 2 Diagrams, 1 Graph
High Permittivity Oxide Gate Stacks on Silicon Incorporating UHV Silicon Nitride Interfacial Layers.
Publikováno v:
MRS Online Proceedings Library; 2001, Vol. 670 Issue 1, p1-5, 5p
Autor:
Higman, T. K.
Publikováno v:
MRS Online Proceedings Library; 2001, Vol. 670 Issue 1, p1-7, 7p
Publikováno v:
MRS Online Proceedings Library; 2000, Vol. 611 Issue 1, p1-6, 6p
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 6, p4153-4156, 4p
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 6, p2805-2808, 4p
Autor:
Fayfield, T., Higman, T. K.
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 3, p1285-1289, 5p