Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Hidenobu Kameda"'
Autor:
Junichi Fujimoto, Yasufumi Kawasuji, Krzysztof Nowak, Hidenobu Kameda, Toshio Yokoduka, Masato Moriya, Takeshi Ohta, Takashi Suganuma, Hakaru Mizoguchi
Publikováno v:
SPIE Proceedings.
Laser Produced Plasma (LPP) Extreme Ultra Violet (EUV) light source is expected to be used for next generation lithography. To realize such performance for industrial use, the main driver laser is one of the key components. Our source uses a high pow
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::805b38a2bc06609d7387d475ce8fb59c
https://doi.org/10.1117/12.916586
https://doi.org/10.1117/12.916586
Autor:
Hakaru Mizoguchi, Tsukasa Hori, Hitoshi Nagano, Hiroaki Nakarai, Shinji Nagai, Kouji Kakizaki, Akihiko Kurosu, Junichi Fujimoto, Takashi Suganuma, Takayuki Yabu, Krzysztof Nowak, Takeshi Ohta, Takanobu Ishihara, Georg Soumagne, Tatsuya Yanagida, Akira Sumitani, Hidenobu Kameda, Tamotsu Abe, Masato Moriya, Yukio Watanabe
Publikováno v:
SPIE Proceedings.
We reported 1st generation Laser-Produced Plasma source system "ETS" device for EUV lithography one year ago1). In this paper we update performance status of the 1st generation system. We have improved the system further, maximum burst power is 104W
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::374e4314cd18f1d2e39a1a4bea0919aa
https://doi.org/10.1117/12.880382
https://doi.org/10.1117/12.880382
Autor:
Junichi Fujimoto, Takeshi Ohta, Krzysztof M. Nowak, Takashi Suganuma, Hidenobu Kameda, Masato Moriya, Toshio Yokoduka, Koji Fujitaka, Akira Sumitani, Hakaru Mizoguchi
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3470597ad84139c86b769c21ffa59ba9
https://doi.org/10.1117/12.879181
https://doi.org/10.1117/12.879181