Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Hidemichi Kawase"'
Publikováno v:
International Journal of Remote Sensing. 41:31-52
For assistance with grazing cattle management, we propose a cattle detection and counting system based on Convolutional Neural Networks (CNNs) using aerial images taken by an Unmanned Aerial Vehicl...
Autor:
Hiroshi Mohri, Masahiro Kato, Yasutaka Morikawa, Isao Miyazaki, Satoshi Aoyama, Shogo Narukawa, Yoshiharu Shika, Hidemichi Kawase, Hiroshi Kabashima, Yoshikazu Nagamura, Aki Nakajo, Tomoko Hatada
Publikováno v:
SPIE Proceedings.
The design shrinking of semiconductor devices and the pattern complexity generated after OPC (optical proximity correction) have an impact on the two major cost consuming processes in mask manufacturing, EB (electron beam) writing and defect assuranc
Autor:
Hiroshi Mohri, Masahiro Kato, Kunihiro Hosono, Yoshikazu Nagamura, Naoya Hayashi, Shogo Narukawa, Hidemichi Kawase
Publikováno v:
SPIE Proceedings.
Load of photomask manufacturing for the most advanced semiconductor devices is increasing due to the complexity of mask layouts caused by highly accurate RET or OPC, tight specification for 2D/3D mask structures, and requirements of quick deliveries.
Autor:
Shigehiro Hara, Yuichi Kawase, Morihisa Hoga, Hidemichi Kawase, Junji Hirumi, Toshio Suzuki, Kokoro Kato, Koki Kuriyama, Satoshi W. Watanabe, Tomoko Kamimoto, Nobuyuki Yoshioka, Yutaka Hojyo
Publikováno v:
SPIE Proceedings.
Mask data preparation (MDP) is a complicated process because many kinds of EB data files and jobdeck data files are used in mask manufacturers and EB data files continue to become bigger. Therefore we have developed unified mask data formats for Vari
Autor:
Hidemichi Kawase, Tomoko Kamimoto, Junji Hirumi, Koki Kuriyama, Toshio Suzuki, Nobuyuki Yoshioka
Publikováno v:
SPIE Proceedings.
Mask data preparation is a complicated process because many kinds of EB data files and jobdeck data files are used in mask manufacturers and EB data files continue to become bigger. Therefore we have started to develop new mask data format with effic