Zobrazeno 1 - 10
of 31
pro vyhledávání: '"Hideki Nishida"'
Autor:
Fabio Hideki Nishida, Alexandre C. Nicolella, Bruno José Canassa, Diego de Freitas Espinoza, Thalles Quinaglia Liduares
Publikováno v:
Revista de Economia e Sociologia Rural, Vol 60, Iss spe (2021)
Resumo: O abandono escolar ainda é uma realidade no Brasil, principalmente no meio rural. Políticas públicas que possam reduzi-lo, mesmo que indiretamente, são importantes. Assim, este trabalho avaliou o impacto da aposentadoria rural, benefício
Externí odkaz:
https://doaj.org/article/571565803019472f8c9f074670127f84
Autor:
Fabio Hideki Nishida1 fabio.nishida@usp.br, Nicolella, Alexandre C.1 nicolella@usp.br, Canassa, Bruno José2 bjcanassa@fearp.usp.br, de Freitas Espinoza, Diego3 diegoespinoza@usp.br, Liduares, Thalles Quinaglia1 thalles.liduares@usp.br
Publikováno v:
Revista de Economia e Sociologia Rural. 2022 Special Issue, Vol. 60, p1-20. 20p.
Autor:
Masami, Fujii, Yasutaka, Ishimaru, Hiroyuki, Takahashi, Hirofumi, Egami, Hideki, Nishida, Shinji, Oka, Komei, Shirabe
Publikováno v:
[Nihon koshu eisei zasshi] Japanese journal of public health. 62(10)
Epilepsy is a common chronic neurological disorder characterized by recurrent unprovoked seizures. The prevalence of epilepsy is about 1%, and its incidence is increasing with the aging population. In addition to their medical problems, epilepsy pati
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::0df499ca32f541a562de77d709664f4c
https://pubmed.ncbi.nlm.nih.gov/26607920
https://pubmed.ncbi.nlm.nih.gov/26607920
Publikováno v:
Journal of Photopolymer Science and Technology. 12:383-390
We have studied the chemical changes that result in photoresist due to various stresses that the photoresist is subjected to during the recovery and reclamation process.(1) When the roll coater recovery photoresist is kept open at room temperature fo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::69c0b773a2761401e698f262acba9513
https://doi.org/10.2494/photopolymer.12.383
https://doi.org/10.2494/photopolymer.12.383
Autor:
Kenji Ohshiro, Hideki Nishida
Publikováno v:
Journal of Photopolymer Science and Technology. 11:153-158
We studied the coagulation which can occur in collected resist solutions and offer a resist reclamation system suitable for simple Matrix Liquid Crystal Display (SMLCD)- manufacturing lines. A lot of particles under a few μm in size are fonned in th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2cae2b35ceecf8448c2a9851a9945f8
https://doi.org/10.2494/photopolymer.11.153
https://doi.org/10.2494/photopolymer.11.153
Autor:
Naoto Taguchi, Satoyo Hosono, Megumi Hara, Emi Morita, Koichi Shinchi, Hideo Tanaka, Sadao Suzuki, Hirokazu Uemura, Michiaki Kubo, Nobuyuki Hamajima, Yasuki Higaki, Keizo Ohnaka, Akihiko Nakamura, Naoyuki Takashima, Haruo Mikami, Mariko Naito, Hideki Nishida
Publikováno v:
Journal of Epidemiology
Background Although the peroxisome proliferator-activated receptor-γ2 (PPARG2) Pro12Ala gene variant is associated with diabetes mellitus, the associations and interactions of this polymorphism and known clinical risk factors with glycated hemoglobi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::91209808b76e08b751a5e634c2d9b7a1
https://pubmed.ncbi.nlm.nih.gov/23006958
https://pubmed.ncbi.nlm.nih.gov/23006958
Publikováno v:
Advances in Resist Technology and Processing XVII.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1e8677747f7eda09c629a4d62611dbd
https://doi.org/10.1117/12.388332
https://doi.org/10.1117/12.388332
Publikováno v:
SPIE Proceedings.
Although it is hard to strip away the photoresist layer damaged during the etching process in manufacturing liquid crystal display devices, monoethynoloamine (MEA) was found to have excellent photoresist stripping characteristics. Crosslinked novolak
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5cf52d0c921dcc9a575a52857a181da5
https://doi.org/10.1117/12.350252
https://doi.org/10.1117/12.350252
Publikováno v:
SPIE Proceedings.
We have studied the chemical changes that result in photoresist used for LCD device manufacturing due to various stresses that the photoresist is subjected to during the recovery and reclamation process. (1) When the roll coater recovery photoresist
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e760cfd9c952461fab07893220167a6c
https://doi.org/10.1117/12.312444
https://doi.org/10.1117/12.312444
Publikováno v:
Journal of the Society for Information Display. 13:841
— The perfluorocarbons (PFCs) used as etching-process and chamber-cleaning gases in the manufacture of LCD devices have a high global-warming potential and a long atmospheric lifetime. Thus, to voluntarily reduce these environmentally harmful PFCs,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7ad4b2f204a7d57ceb96c4b847fc1d0d
https://doi.org/10.1889/1.2121068
https://doi.org/10.1889/1.2121068