Zobrazeno 1 - 10
of 104
pro vyhledávání: '"Hideki Nakazawa"'
Autor:
HIDEKI NAKAZAWA, DAISUKE TAKAISHI, TAKUYA TAKEMATSU, MAKOTO NEZAKI, MASAHIRO NAKAYAMA, RYUUICHI KOMA, MASAKAZU TAGUCHI
Publikováno v:
WIT Transactions on The Built Environment.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d03ca2a540cbeed655911cb5ac889e44
https://doi.org/10.2495/cr220161
https://doi.org/10.2495/cr220161
Autor:
DAISUKE TAKAISHI, HIDEKI NAKAZAWA, TAKUYA TAKEMATSU, NAOKI YAMANAKA, HIDEYUKI YOSHIOKA, YOSHITAKA TAKEMOTO, TAKAMICHI ENDO
Publikováno v:
WIT Transactions on The Built Environment.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f5565626b4e15e2dd0fd561f9c98e196
https://doi.org/10.2495/cr220171
https://doi.org/10.2495/cr220171
Autor:
Yuya Sasaki, Hiroya Osanai, Yusuke Ohtani, Yuta Murono, Masayoshi Sato, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki, Hideki Nakazawa
Publikováno v:
Diamond and Related Materials. 123:108878
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d8e4db8e22798c70774562fbee3023b
https://doi.org/10.1016/j.diamond.2022.108878
https://doi.org/10.1016/j.diamond.2022.108878
Autor:
Hiroya Osanai, Kazuki Nakamura, Yuya Sasaki, Haruto Koriyama, Yasuyuki Kobayashi, Yoshiharu Enta, Yushi Suzuki, Maki Suemitsu, Hideki Nakazawa
Publikováno v:
Thin Solid Films. 745:139100
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6048f099bd38d53fb9dc067ba2683fb0
https://doi.org/10.1016/j.tsf.2022.139100
https://doi.org/10.1016/j.tsf.2022.139100
Publikováno v:
Thin Solid Films. 654:38-48
We have deposited silicon-incorporated diamond-like carbon (Si-DLC) films by plasma-enhanced chemical vapor deposition using monomethylsilane (CH3SiH3; MMS) as a Si source, and systematically investigated the impacts of substrate bias and dilution ga
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a7c61c75ff9993447d44373aece289d1
https://doi.org/10.1016/j.tsf.2018.03.075
https://doi.org/10.1016/j.tsf.2018.03.075
Autor:
H. Ohashi, Yoshiharu Enta, Kazuki Nakamura, Yushi Suzuki, Hideki Nakazawa, Maki Suemitsu, Yasuyuki Kobayashi
Publikováno v:
Thin Solid Films. 736:138923
We have investigated the effects of silicon (Si) doping on the chemical bonding states and the electrical, optical, and mechanical properties of nitrogen-doped diamond-like carbon (N−DLC) films prepared via plasma-enhanced chemical vapor deposition
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::420446329c4e66daad06e13af1f805b2
https://doi.org/10.1016/j.tsf.2021.138923
https://doi.org/10.1016/j.tsf.2021.138923
Autor:
Haruka Ogasawara, Takahiro Takami, Yoshiharu Enta, Hideki Nakazawa, Kohei Magara, Yushi Suzuki
Publikováno v:
Thin Solid Films. 636:177-182
We have deposited silicon/nitrogen-incorporated diamond-like carbon (Si-N-DLC) films by plasma-enhanced chemical vapor deposition using dimethylsilane [SiH2(CH3)2; DMS] and N2 as the Si and N sources, respectively. We compared the properties of the S
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2fcc0d65cee490eebeff13cc8738289d
https://doi.org/10.1016/j.tsf.2017.05.046
https://doi.org/10.1016/j.tsf.2017.05.046
Publikováno v:
Journal of Crystal Growth. 460:27-36
We have grown aluminum nitride (AlN) films on Si(110) substrates by pulsed laser deposition (PLD), and investigated the effects of laser power on the crystallinity and surface morphology of the AlN films. First, we epitaxially grew a fairly flat, hig
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b7530ca12b01a3a48b670672626b77b8
https://doi.org/10.1016/j.jcrysgro.2016.12.068
https://doi.org/10.1016/j.jcrysgro.2016.12.068
Publikováno v:
Thin Solid Films. 692:137638
Pentacene and fullerene (C60) form an efficient stacked heterostructure in organic solar cells, and C60 films exhibit high crystallinity on pentacene films. However, the mechanism of the crystallinity improvement in C60 overlayers remains to be fully
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9add60f337c76d065d26bbc8560b5b91
https://doi.org/10.1016/j.tsf.2019.137638
https://doi.org/10.1016/j.tsf.2019.137638