Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Hidehiro Higashino"'
Autor:
Masaki Mori, Tadashi Imoriya, Iwao Higashikawa, N. Iriki, Toshio Onodera, M. Homma, Tai Sato, T. Matsuda, Norihiko Miyazaki, Hidehiro Higashino, Nobuyuki Yoshioka, K. Okuda
Publikováno v:
SPIE Proceedings.
We reported the Guideline(Ver. 1) of Reticle Data Management(RDM) Activity in 2001. Among we have been focused SoC(System on Chip) Business, we have been improved the efficiency over Design technology, Mask manufacturing and Wafer manufacturing. Espe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::261895852794ea3a4a69414ddc646fcc
https://doi.org/10.1117/12.557741
https://doi.org/10.1117/12.557741
Autor:
M. Homma, T. Matsuda, Iwao Higashikawa, Norihiko Miyazaki, Hidehiro Higashino, Nobuyuki Yoshioka, Nobuyuki Iriki, Tai Sato, Toshio Onodera, T. Uga
Publikováno v:
SPIE Proceedings.
We reported the Guideline (Ver.1) of Reticle Data Management (RDM) Activity in 2001. While focusing on SoC (System on Chip) business, we have improved the efficiency in design technology, mask manufacturing and wafer manufacturing. Especially, these
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::efec3d9859657e61d7e1b879fb4053d9
https://doi.org/10.1117/12.568028
https://doi.org/10.1117/12.568028
Publikováno v:
SPIE Proceedings.
We developed a new focus monitoring method that is simple yet highly accurate. We used simple measurement tools: a conventional binary mask and an optical overlay inspection machine. Our method was sufficiently precise to detect sub-100nm focus error
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da30f0c572e0145c7bcd46185e9224a2
https://doi.org/10.1117/12.485353
https://doi.org/10.1117/12.485353
Autor:
Iwao Higashikawa, K. Okuda, M. Mori, Nobuyuki Yoshioka, Tai Sato, T. Matsuda, M. Homma, Toshio Onodera, N. Iriki, Tadashi Imoriya, Norihiko Miyazaki, Hidehiro Higashino
Publikováno v:
SPIE Proceedings.
We reported the Guideline(Ver.1) of Reticle Data Management (RDM) Activity in 2001. Among we have been focused SoC(System on Chip) Business, we have been improved the efficiency over Design technology, Mask manufacturing and Wafer manufacturing. Espe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4a69e3d5a9d3dc6b89c264a339a4339c
https://doi.org/10.1117/12.484438
https://doi.org/10.1117/12.484438