Zobrazeno 1 - 10
of 183
pro vyhledávání: '"Hexachlorodisilane"'
Autor:
Philipp N. Plessow, Krzysztof Woźniak, Peter Hofmann, Phillip Iain Jolly, Damian Trzybiński, Łukasz Kapuśniak
Publikováno v:
Organometallics
Organometallics, 40, 693-701
Organometallics, 40, 693-701
The metal-free reduction of a range of phosphine(V) oxides employing oxalyl chloride as an activating agent and hexachlorodisilane as reducing reagent has been achieved under mild reaction conditions. The method was successfully applied to the reduct
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::44b1e90726339f075d7bb0fbdf0206d1
http://europepmc.org/articles/PMC8043083
http://europepmc.org/articles/PMC8043083
Autor:
Ram Ramachandran, Sheng-Hsun Wang, Cheng-Chieh Wang, Chien-Ho Liu, Mo-Geng Chin, Jenq-Renn Chen, Hsiao-Yun Tsai, Yu-Jhen Lin, Eugene Y. Ngai
Publikováno v:
ACS Omega, Vol 4, Iss 1, Pp 1416-1424 (2019)
ACS Omega
ACS Omega
In this work, the shock sensitivity of hexachlorodisilane (HCDS) hydrolysis products was studied. The hydrolysis conditions included vapor and liquid HCDS hydrolysis in moist air. Shock sensitivity was determined by using a Fall hammer apparatus. Ext
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bb0e6fafad1827fcccd9854b73e42617
https://doaj.org/article/5c7048db435e4fd2bc51adcbcb0c9d2c
https://doaj.org/article/5c7048db435e4fd2bc51adcbcb0c9d2c
Publikováno v:
Zeitschrift für Naturforschung B.
The λ 6Si-silicate [Cs(18-crown-6)]2[Si(OSO2CH3)6] (1) was synthesized by treatment of Si2Cl6 with Cs[OSO2CH3] in the presence of 18-crown-6. Compound 1 is the first example of a λ 6Si-silicate with a methanesulfonate ligand. It was characterized b
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bad6bfdf4b97676c367ee606c3b7731c
https://doi.org/10.1515/znb-2021-0068
https://doi.org/10.1515/znb-2021-0068
Autor:
Byung Keun Hwang, Gary Goodman, Lanxia Cheng, Harrison Sejoon Kim, Aswin L. N. Kondusamy, Xin Meng, Antonio T. Lucero, Si Joon Kim, Jiyoung Kim, Alan S. Wan, Su Min Hwang, Young-Chul Byun, Telgenhoff Michael D, Joy S. Lee, Robert M. Wallace
Publikováno v:
ACS Applied Materials & Interfaces. 10:44825-44833
Correlations between physical properties linking film quality with wet etch rate (WER), one of the leading figures of merit, in plasma-enhanced atomic layer deposition (PEALD) grown silicon nitride (SiNx) films remain largely unresearched. Achieving
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::23472c32f3fe282a6779bcd299a81952
https://doi.org/10.1021/acsami.8b15291
https://doi.org/10.1021/acsami.8b15291
Publikováno v:
Industrial & Engineering Chemistry Research. 57:10354-10364
The hydrolysis products of hexachlorodisilane (HCDS) show common heat sensitivity and can become shock sensitive under certain conditions. Study of the shock sensitivity has been difficult due to the unpredictable nature of this phenomenon. We have i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::944e6131a2b551eb1203c9560904336e
https://doi.org/10.1021/acs.iecr.8b01241
https://doi.org/10.1021/acs.iecr.8b01241
Autor:
Jiyoung Kim, Jeanette Young, Su Min Hwang, Young-Chul Byun, Telgenhoff Michael D, Xiaobing Zhou, Joy S. Lee, Byung Keun Hwang, Xin Meng, Harrison Sejoon Kim, Antonio T. Lucero
Publikováno v:
ACS Applied Materials & Interfaces. 10:14116-14123
In this work, a novel chlorodisilane precursor, pentachlorodisilane (PCDS, HSi2Cl5), was investigated for the growth of silicon nitride (SiNx) via hollow cathode plasma-enhanced atomic layer deposition (PEALD). A well-defined self-limiting growth beh
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::de3fb5ad171b2a8c77318cc4789c6c5c
https://doi.org/10.1021/acsami.8b00723
https://doi.org/10.1021/acsami.8b00723
Akademický článek
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Autor:
Hui-Chu Tai, Zhi-Xuan Lin, Thanh-Trung Nguyen, Jenq-Renn Chen, Yu-Jhen Lin, Eugene Y. Ngai, Hsiao-Yun Tsai
Publikováno v:
Journal of Loss Prevention in the Process Industries. 71:104455
In this work, the effects of potassium hydroxide (KOH) on friction and shock sensitivity of the hexachlorodisialne hydrolysis products were studied. A wide range of KOH content, from 0.02 to 21.5 wt%, in the mixture of KOH and HCDS hydrolyzed deposit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec8d5e781806cd36f702f4d055da0e70
https://doi.org/10.1016/j.jlp.2021.104455
https://doi.org/10.1016/j.jlp.2021.104455
Publikováno v:
Journal of the Korean Ceramic Society. 54:443-447
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c343f2e10362cbe6b2aca35b259b0107
https://doi.org/10.4191/kcers.2017.54.5.11
https://doi.org/10.4191/kcers.2017.54.5.11
Akademický článek
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