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pro vyhledávání: '"Herman Gene Oceanside Hockenhull"'
Autor:
Herman Gene Oceanside Hockenhull, David L. O'Meara, Arthur Kenneth Hochberg, David Allen Roberts, Felicia Rusnak
Publikováno v:
MRS Proceedings. 204
The series of azidosilanes, SiEtn(N3)4-n where n = 1,2,3 and Si(t-butyl)(N3)3 were evaluated for the LPCVD of silicon nitride thin films. Both SiEt(N3)3 and Si(t-butyl)(N3)3 gave deposition rates of approximately 100 Å/min at temperatures of 450–5
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83e0a64d3fb8dfefe86fa64f59b326a7
https://doi.org/10.1557/proc-204-515
https://doi.org/10.1557/proc-204-515
