Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Herbert A. Waggener"'
Publikováno v:
Photomask and X-Ray Mask Technology.
Mask and reticle writing requirements for 256 Mb and 1 Gb DRAM production will place stringent demands on lithography tool capabilities. The Lepton EBES4 mask writer addresses these requirements by utilizing advanced generation e-beam technology whic
Autor:
A. R. von Neida, Herbert A. Waggener, Darryl Peters, D. C. Fowlis, C. M. Rose, William P. Wilson
Publikováno v:
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III.
Performance specifications, electron gun parameters, selected testing results, and calculated throughput are presented for the second prototype EBES4 which is entering manufacture. The thermal field emitter electron gun is designed for high flux, hig
Autor:
William P. Wilson, A. R. von Neida, D. C. Fowlis, Herbert A. Waggener, Darryl Peters, C. M. Rose
Publikováno v:
SPIE Proceedings.
Performance specifications, electron gun parameters, testing results to date, and throughput are presented for the second prototype EBES4 which is entering manufacture. The thermal field emitter electron gun is designed for high flux, high current st
Autor:
Darryl Peters, C. M. Rose, J. Caracci, A. Chitayat, G. Chen, Herbert A. Waggener, D. C. Fowlis
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 9:3033
A study was undertaken to quantify and minimize mechanically induced sources of electron‐beam positioning errors in Lepton EBES4. Stage performance was improved by replacing the x axis rotary motor and ball‐screw drive with a brushless, sinewave,
Conference
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