Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Heonjong Jeong"'
Autor:
Seung Gi Seo, Chang Mo Yoon, Hyun-Ho Lee, Heonjong Jeong, Jong Hyun Ahn, Taejin Choi, Venkateswara R. Chitturi, Taewook Nam, Hima Kumar Lingam, Yunjung Choi, Hyungjun Kim, Andrey Korolev
Publikováno v:
Applied Surface Science. 485:381-390
In the present study, SiO2 was deposited using the atomic layer deposition (ALD) with a 1,2-bis(diisopropylamino)disilane (BDIPADS) precursor. The use of this precursor exhibited a higher growth rate and lower initial growth temperature than the use
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::79d59fddb62a388fecb48b3cb57fdf7b
https://doi.org/10.1016/j.apsusc.2019.03.227
https://doi.org/10.1016/j.apsusc.2019.03.227
Publikováno v:
Chemistry of Materials. 31:5502-5508
SiO2 is one of the most important dielectric materials that is widely used in the microelectronics industry, but its growth or deposition requires high thermal budgets. Herein, we report a low-temp...
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c33d955b813e12ed92a6ca2b7d9b804
https://doi.org/10.1021/acs.chemmater.9b01107
https://doi.org/10.1021/acs.chemmater.9b01107