Zobrazeno 1 - 10
of 13
pro vyhledávání: '"Henry Chris Hamaker"'
Autor:
Mike Bohan, M. Duane, Paul C. Allen, Peter Pirogovsky, Eric R. Christenson, Malik K. Sadiq, Sam C. Howells, Boaz Kenan, Michael White, Robin Teitzel, H. Dai, Henry Chris Hamaker
Publikováno v:
SPIE Proceedings.
The capability and performance of the production-proven DUV ALTA 4300 system has been extended by the development of two new optical subsystems: a 0.9 NA, 42X reduction lens and a high-bandwidth acousto-optic deflector based beam position and intensi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::06ca1a304ad2952e100a66a6f85bcc76
https://doi.org/10.1117/12.637280
https://doi.org/10.1117/12.637280
Publikováno v:
SPIE Proceedings.
The write time of an ALTA 3000HT mask writer has been observed to be up to 36% better than that of the ALTA 3000 system. The ALTA 3000HT system enables users to meet their performance requirements at increased production capacity with the use of new
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::df931f60e5f63944ca4b9eb9d5f67c04
https://doi.org/10.1117/12.425085
https://doi.org/10.1117/12.425085
Publikováno v:
SPIE Proceedings.
New writing strategies have been developed to meet the demand for high-volume mask manufacturing. The ALTA® 3000HT system enables users to meet their performance requirements at increased production capacity. The write time of an ALTA 3000HT mask wr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4e3f3a81a76a6e7df7758d41c7fd9b15
https://doi.org/10.1117/12.410724
https://doi.org/10.1117/12.410724
Autor:
Cris G. Morgante, Henry Chris Hamaker
Publikováno v:
SPIE Proceedings.
Critical dimension (CD) uniformity, stripe butting, and composite overlay results from incremental improvements in critical subsystems on the ALTA 3500 have been previously reported. Integrating those optimized subsystems with another major subsystem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1e69ffeee0649c097bb6afd64ef85c7f
https://doi.org/10.1117/12.392079
https://doi.org/10.1117/12.392079
Autor:
Gregory E. Valentin, Henry Chris Hamaker, Lorna D. Hodgson, Mike Pochkowski, Brenda G. Martinez, Jerry Martyniuk
Publikováno v:
SPIE Proceedings.
Modifications have been made to the ALTA R 3500 system to improve critical dimension (CD) control in three ways. First, the mean-to-target performance has been improved by increasing the repeatability of the measurement of optical efficiency, thereby
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a6dd2614582ab1838393a0d5bee06b3f
https://doi.org/10.1117/12.373353
https://doi.org/10.1117/12.373353
Autor:
Henry Chris Hamaker, Peter D. Buck
Publikováno v:
SPIE Proceedings.
Tomeet the challenges of peak production of 0.25-rim design rule photomasks, a new generation of scanned-laser reticle writershas been developed. Based on the architecture of the ALTA 3000, the resolution and critical dimension (CD) control have been
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0c934bf92b4e8050c5f7bea2a8c93675
https://doi.org/10.1117/12.301205
https://doi.org/10.1117/12.301205
Autor:
Henry Chris Hamaker, Jeffrey K. Varner, Keith P. Standiford, Robert M. Sills, Jerry Martyniuk
Publikováno v:
SPIE Proceedings.
Two of the key performance parameters in the manufacture of photomasks and reticles are composite placement and composite overlay. Multipoint fitting of the placement and overlay errors is typically used in specifying the performance of the printing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a1689e2b02ec4d440869d701a2f8288d
https://doi.org/10.1117/12.262820
https://doi.org/10.1117/12.262820
Autor:
Henry Chris Hamaker
Publikováno v:
SPIE Proceedings.
Statistical process control (SPC) techniques often use six times the standard deviation sigma to estimate the range of errors within a process. Two assumptions are inherent in this choice of metric for the range: (1) the normal distribution adequatel
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b3f404f890d605556ef2fd54dbd4aa71
https://doi.org/10.1117/12.228171
https://doi.org/10.1117/12.228171
Publikováno v:
SPIE Proceedings.
The use of multipass printing to reduce the magnitude of the registration and critical- dimension (CD) errors on photomasks through averaging has been demonstrated in laser- scanned reticle-writing systems, such as the ALTAR 3000 and the CORER family
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b47cfe7add0467fe634b56e779980ed5
https://doi.org/10.1117/12.228185
https://doi.org/10.1117/12.228185
Publikováno v:
SPIE Proceedings.
Techniques have been developed that can quickly and accurately measure corner rounding and contact fill as key indicators of pattern fidelity. Using these techniques, we have examined writing variables for their effect on the lithographic quality of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::072add6636099e5a2a485637fc53026d
https://doi.org/10.1117/12.212810
https://doi.org/10.1117/12.212810