Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Henning Stoschus"'
Autor:
Slawomir Czerkas, Ulrich Pohlmann, Richard Wang, Yoram Uziel, Nadav Gutman, Roel Gronheid, Yoel Feler, Frank Laske, Moran Zaberchik, Evgeni Gurevich, Yoav Grauer, Henning Stoschus
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
We show that an overlay (OVL) metrology system based on a scanning electron microscope can achieve accurate registration of buried and resist (top) structures. The positions were determined by both Back Scattered Electrons (BSE) and Secondary Electro
Autor:
Carsten Leinweber, Frederic Ballach, Ralf Christoph, Marc Kachelrieß, Henning Stoschus, Tobias Müller, Michael Hammer, Joscha Maier, Stefan Sawall
Publikováno v:
Measurement Science and Technology. 28:065011
Computed tomography (CT) is a valuable tool for the metrolocical assessment of industrial components. However, the application of CT to the investigation of highly attenuating objects or multi-material components is often restricted by the presence o
Autor:
S. Brezinsek, Henning Stoschus, Karl Heinz Finken, Detlev Reiter, Dirk Reiser, Sadrilla S. Abdullaev, M. Clever, Dominik Schega, Michael Lehnen, Oliver Schmitz, U. Samm, J. W. Coenen, M. W. Jakubowski, B. Unterberg
Publikováno v:
Plasma and Fusion Research. 3:S1039-S1039
The topological and transport properties in the edge plasma of the dynamic ergodic divertor is studied to clarify the functionality of this type of helical divertor. The heat and particle fluxes at the DED target plates were measured with Langmuir pr
Autor:
Joscha Maier, Carsten Leinweber, Stefan Sawall, Henning Stoschus, Frederic Ballach, Tobias Müller, Michael Hammer, Ralf Christoph, Marc Kachelrieß
Publikováno v:
Measurement Science & Technology; May2017, Vol. 28 Issue 6, p1-1, 1p