Characterization of plasmas driven by laser wavelengths in the 1.064-10.6 $\mu$m range as future extreme ultraviolet light sources

Autor: Hemminga, D. J., Versolato, O. O., Sheil, J.

We characterize the properties of extreme ultraviolet (EUV) light source plasmas driven by laser wavelengths in the $\lambda_{\mathrm{laser}} = 1.064 - 10.6 $ $\mu$m range. Detailed numerical simulations of laser-irradiated spherical tin microdroplet

Externí odkaz: http://arxiv.org/abs/2208.14223

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Power-Law Scaling Relating the Average Charge State and Kinetic Energy in Expanding Laser-Driven Plasmas.

Autor: Sheil J; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit Amsterdam, De Boelelaan 1081, 1081 HV Amsterdam, The Netherlands., Poirier L; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit Amsterdam, De Boelelaan 1081, 1081 HV Amsterdam, The Netherlands., Lassise AC; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands., Hemminga DJ; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit Amsterdam, De Boelelaan 1081, 1081 HV Amsterdam, The Netherlands., Schouwenaars S; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Applied Physics, Eindhoven University of Technology, Den Dolech 2, 5600 MB Eindhoven, The Netherlands., Braaksma N; ASML US LP, 17075 Thornmint Ct, San Diego, California 92127, USA., Frenzel A; ASML US LP, 17075 Thornmint Ct, San Diego, California 92127, USA., Hoekstra R; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Zernike Institute for Advanced Materials, University of Groningen, Nijenborgh 4, 9747 AG Groningen, The Netherlands., Versolato OO; Advanced Research Center for Nanolithography, Science Park 106, 1098 XG Amsterdam, The Netherlands.; Department of Physics and Astronomy, and LaserLaB, Vrije Universiteit Amsterdam, De Boelelaan 1081, 1081 HV Amsterdam, The Netherlands.

Publikováno v: Physical review letters [Phys Rev Lett] 2024 Sep 20; Vol. 133 (12), pp. 125101.