Zobrazeno 1 - 10
of 1 765
pro vyhledávání: '"Helmersson, A."'
Autor:
Pankratova, Daria, Yusupov, Khabib, Vomiero, Alberto, Honnali, Sanath Kumar, Boyd, Robert, Ekeroth, Sebastian, Helmersson, Ulf, Azina, Clio, Febvrier, Arnaud le
Nanostructured materials and nanocomposites have shown great promise for improving the efficiency of thermoelectric materials. Herein, Fe nanoparticles were imbedded into a CrN matrix by combining two physical vapor deposition approaches, namely high
Externí odkaz:
http://arxiv.org/abs/2304.07566
Autor:
Fugeray-Scarbel A, Bouffier L, Lemarié S, Sánchez L, Alia R, Biselli C, Buiteveld J, Carra A, Cattivelli L, Dowkiw A, Fontes L, Fricano A, Gion J-M, Grima-Pettenati J, Helmersson A, Lario F, Leal L, Mutke S, Nervo G, Persson T, Rosso L, Smulders MJM, Steffenrem A, Vietto L, Haapanen M
Publikováno v:
iForest - Biogeosciences and Forestry, Vol 17, Iss 1, Pp 45-58 (2024)
Genetically improved forest reproductive materials are now widely accessible in many European countries due to decades of continuous breeding efforts. Tree breeding does not only contribute to higher-value end products but allows an increase in the r
Externí odkaz:
https://doaj.org/article/ba511de61cc84d2baf4902383e7bf24f
A method for growing nanoparticles with different elemental compositions simply by changing pulsing parameters in a power supply is demonstrated. The technique is based on high power pulsed hollow cathode sputtering, and the difference in particle co
Externí odkaz:
http://arxiv.org/abs/2010.15013
Autor:
Du, Hao, Shu, Rui, Boyd, Robert, Febvrier, Arnaud le, Sortica, Mauricio A., Primetzhofer, Daniel, Helmersson, Ulf, Eklund, Per, Lundin, Daniel
Publikováno v:
In Scripta Materialia September 2023 234
Autor:
Viloana, Rommel Paulo B., Gub, Jiabin, Boyda, Robert, Keraudya, Julien, Li, Liuhe, Helmersson, Ulf
The effect of applying a positive voltage pulse (Urev = 10 - 150 V) directly after the negative high power impulse magnetron sputtering (HiPIMS) pulse (bipolar HiPIMS) is investigated for the reactive sputter deposition of TiN thin films. Energy-reso
Externí odkaz:
http://arxiv.org/abs/1906.06074
Autor:
Du, Hao, Shu, Rui, Boyd, Robert, le Febvrier, Arnaud, Helmersson, Ulf, Eklund, Per, Lundin, Daniel
Publikováno v:
In Surface & Coatings Technology 25 April 2023 459
Publikováno v:
In Surface & Coatings Technology 15 February 2023 454
Autor:
Villamayor, Michelle Marie S., Keraudy, Julien, Shimizu, Tetsuhide, Viloan, Rommel Paulo B., Boyd, Robert, Lundin, Daniel, Greene, J. E., Petrova, Ivan, Helmersson, Ulf
Low-temperature epitaxial growth of refractory transition-metal nitride thin films by means of physical vapor deposition has been a recurring theme in advanced thin-film technology for several years. In the present study, 150-nm-thick epitaxial HfN l
Externí odkaz:
http://arxiv.org/abs/1808.10614
Autor:
Gunnarsson, Rickard, Brenning, Nils, Ojamae, Lars, Kalered, Emil, Raadu, Michael Allan, Helmersson, Ulf
Publikováno v:
J. Phys. D: Appl. Phys. 51, 455202 (2018)
The nucleation and growth of pure titanium nanoparticles in a low-pressure sputter plasma has been believed to be essentially impossible. The addition of impurities, such as oxygen or water, facilitates this and allows the growth of nanoparticles. Ho
Externí odkaz:
http://arxiv.org/abs/1801.10411
Publikováno v:
J. Phys. D: Appl. Phys. 51, 455201 (2018)
A constant supply of oxygen has been assumed to be necessary for the growth of titanium nanoparticles by sputtering. This oxygen supply can arise from a high background pressure in the vacuum system or from a purposely supplied gas. The supply of oxy
Externí odkaz:
http://arxiv.org/abs/1801.10393