Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Heiko Mentzel"'
Autor:
Qais Saadeh, Philipp Naujok, Devesh Thakare, Meiyi Wu, Vicky Philipsen, Frank Scholze, Christian Buchholz, Zanyar Salami, Yasser Abdulhadi, Danilo Ocaña García, Heiko Mentzel, Anja Babuschkin, Christian Laubis, Victor Soltwisch
Publikováno v:
Optik. 273:170455
ispartof: OPTIK vol:273 status: published
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::3a602b48134dc31327ebb4ab40174841
https://doi.org/10.1016/j.ijleo.2022.170455
https://doi.org/10.1016/j.ijleo.2022.170455
Autor:
Richard Ciesielski, Leonhard M. Lohr, Analía Fernández Herrero, Andreas Fischer, Alexander Grothe, Heiko Mentzel, Frank Scholze, Victor Soltwisch
Publikováno v:
Review of Scientific Instruments. 94:013904
Smaller and more complex nanostructures in the semiconductor industry require a constant upgrade of accompanying metrological methods and equipment. A central task for nanometrology is the precise determination of structural features of gratings in t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::834b5f348202ee539879648881cccfd1
https://doi.org/10.1063/5.0120146
https://doi.org/10.1063/5.0120146
Autor:
Victor Soltwisch, Anja Schönstedt, Qais Saadeh, Christian Buchholz, Christian Stadelhoff, Anna Andrle, Philipp Naujok, Vicky Philipsen, Philipp Hönicke, Heiko Mentzel, Frank Scholze, Christian Laubis
Publikováno v:
Optics Express. 29:40993
The optical constants of ruthenium in the spectral range 8 nm to 23.75 nm with their corresponding uncertainties are derived from the reflectance of a sputtered ruthenium thin film in the Extreme Ultraviolet (EUV) spectral range measured using monoch
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5e36b4388881437c3b84abee11bb5dd4
https://doi.org/10.1364/oe.426029
https://doi.org/10.1364/oe.426029
Autor:
Annett Barboutis, Ayhan Babalik, Jana Puls, Christian Stadelhoff, Anja Schönstedt, Jana Lehnert, Claudia Tagbo, Christian Laubis, Michael Sintschuk, Anja Babuschkin, Heiko Mentzel, Andreas Fischer, Frank Scholze, Christian Buchholz, Sina Jaroslawzew
Publikováno v:
Extreme Ultraviolet (EUV) Lithography X.
For EUV-lithography, reliable measurements of the radiant power throughout the optical chain are an essential requirement for the optimization of the lithographic production process as well as for the development of new applications like EUV-based me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::37df636c64aaf4f39073c293cb67a02f
https://doi.org/10.1117/12.2514933
https://doi.org/10.1117/12.2514933
Autor:
Frank Scholze, Heiko Mentzel, Sina Jaroslawzew, Analía Fernández Herrero, Victor Soltwisch, Christian Laubis
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
The advance of the semiconductor industry requires new metrology methods, which can deal with smaller and more complex nanostructures. Particularly for inline metrology a rapid, sensitive and non destructive method is needed. Small angle X-ray scatte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1735600d5e59d325b1161595c5765c29
https://doi.org/10.1117/12.2297195
https://doi.org/10.1117/12.2297195
Autor:
Heiko Mentzel, D. Yves von Cramon, Sven Hessler, Stefan Zysset, Lin Chen, Gabriele Lohmann, Karsten Müller, Volker Bosch
Publikováno v:
Computerized Medical Imaging and Graphics
This paper describes the non-commercial software system Lipsia that was developed for the processing of functional magnetic resonance images (fMRI) of the human brain. The analysis of fMRI data comprises various aspects including filtering, spatial t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::752f324e33960f492379b9fee2ef23c9
https://pubmed.ncbi.nlm.nih.gov/11679206
https://pubmed.ncbi.nlm.nih.gov/11679206
Publikováno v:
Optics Letters. 38:4112
We demonstrate that random lasers provide an outstanding strobe light source for time-resolved microscopy. Utilizing a random laser to illuminate a commercially available microscope enables single exposure, speckle-free time-resolved imaging. Aside f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6aa425164b38795344e4aed0c1b90839
https://doi.org/10.1364/ol.38.004112
https://doi.org/10.1364/ol.38.004112
Autor:
Volker Bosch, Gabriele Lohmann, Karsten Müller, Nils H. Busch, D. Yves von Cramon, Heiko Mentzel
Publikováno v:
NeuroImage. 13:190
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9af1f7f4a5a9d86151c92c33e7ff7945
https://doi.org/10.1016/s1053-8119(01)91533-2
https://doi.org/10.1016/s1053-8119(01)91533-2
Autor:
Annett Barboutis, Anton Haase, Christian Stadelhoff, Christian Buchholz, Florian Knorr, Anja Schönstedt, Heiko Mentzel, Frank Scholze, Victor Soltwisch, Andreas Fischer, Christian Laubis, Michael Sintschuk, Jana Puls
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII
The development of technology infrastructure for EUV Lithography (EUVL) still requires higher levels of technology readiness in many fields. A large number of new materials will need to be introduced. For example, development of EUV compatible pellic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ba546d194046fd7967e4dc251d56750a
