Plasma-assisted Discharges and Charging in EUV-induced Plasma

Autor: van de Kerkhof, Mark, Yakunin, Andrei M., Kvon, Vladimir, Cats, Selwyn, Heijmans, Luuk, Chaudhuri, Manis, Asthakov, Dmitry

In the past years, EUV lithography scanner systems have entered High-Volume Manufacturing for state-of-the-art Integrated Circuits (IC), with critical dimensions down to 10 nm. This technology uses 13.5 nm EUV radiation, which is transmitted through

Externí odkaz: http://arxiv.org/abs/2012.03027

Streamer knotwilg branching; sudden transition in morphology of positive streamers in nitrogen

Autor: Heijmans, Luuk, Clevis, T.T.J., Nijdam, Sander, Veldhuizen, E.M., Ebert, Ute

Publikováno v: Journal of Physics D: Applied Physics, 48, 1-10

We describe a peculiar branching phenomenon in positive repetitive streamer discharges in high purity nitrogen. We name it knotwilg branching after the Dutch word for a pollard willow tree. In a knotwilg branching a thick streamer suddenly splits int

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::2752fad04ac79c20b773fcc194842dda
https://ir.cwi.nl/pub/23840

Charging and Mobilization of Dust Particles on a Surface in Plasma.

Autor: Pagán Muñoz JH; NASA SSERVI's Institute for Modeling Plasma, Atmospheres and Cosmic Dust (IMPACT), University of Colorado, Boulder, Colorado 80303, USA.; Laboratory for Atmospheric and Space Physics (LASP), University of Colorado, Boulder, Colorado 80303, USA., Wang X; NASA SSERVI's Institute for Modeling Plasma, Atmospheres and Cosmic Dust (IMPACT), University of Colorado, Boulder, Colorado 80303, USA.; Laboratory for Atmospheric and Space Physics (LASP), University of Colorado, Boulder, Colorado 80303, USA., Horányi M; NASA SSERVI's Institute for Modeling Plasma, Atmospheres and Cosmic Dust (IMPACT), University of Colorado, Boulder, Colorado 80303, USA.; Laboratory for Atmospheric and Space Physics (LASP), University of Colorado, Boulder, Colorado 80303, USA., Kvon V; ASML, Eindhoven, The Netherlands., Heijmans L; ASML, Eindhoven, The Netherlands., Chaudhuri M; ASML, Eindhoven, The Netherlands., van de Kerkhof M; ASML, Eindhoven, The Netherlands., Yakunin AM; ASML, Eindhoven, The Netherlands., Krainov P; ISTEQ B.V., High Tech Campus 9, 5656 AE Eindhoven, The Netherlands., Astakhov D; ISTEQ B.V., High Tech Campus 9, 5656 AE Eindhoven, The Netherlands.

Publikováno v: Physical review letters [Phys Rev Lett] 2024 Sep 13; Vol. 133 (11), pp. 115301.